An In Situ Ellipsometric Study of the Competitive Adsorption of PEG-/Cl-/(SPS/MPS)on Cu

ECS Transactions ◽

10.1149/1.2408869 ◽

2019 ◽

Vol 2 (6) ◽

pp. 117-129

Author(s):

Marlon L. Walker ◽

Lee Richter ◽

T. Moffat

Keyword(s):

Competitive Adsorption ◽

Ellipsometric Study

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An In Situ Ellipsometric Study of the Competitive Adsorption of PEG-/Cl-/(SPS/MPS)on Cu

ECS Meeting Abstracts ◽

10.1149/ma2006-01/10/425 ◽

2006 ◽

Keyword(s):

Competitive Adsorption ◽

Ellipsometric Study

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Competitive Adsorption of PEG, Cl[sup −], and SPS/MPS on Cu: An In Situ Ellipsometric Study

Journal of The Electrochemical Society ◽

10.1149/1.2206999 ◽

2006 ◽

Vol 153 (8) ◽

pp. C557 ◽

Author(s):

Marlon L. Walker ◽

Lee J. Richter ◽

Thomas P. Moffat

Keyword(s):

Competitive Adsorption ◽

Ellipsometric Study

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In Situ Ellipsometric Study and Point Defect Modeling of Passivity on Iron in Borate Buffer Solutions

ECS Meeting Abstracts ◽

10.1149/ma2010-02/15/1256 ◽

2010 ◽

Keyword(s):

Point Defect ◽

Borate Buffer ◽

Defect Modeling ◽

Buffer Solutions ◽

Ellipsometric Study

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In situ ellipsometric study of As capping and low temperature molecular-beam epitaxy GaAs growth and implications for the low temperature critical thickness

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.586953 ◽

1993 ◽

Vol 11 (4) ◽

pp. 1423 ◽

Author(s):

K. G. Eyink

Keyword(s):

Molecular Beam Epitaxy ◽

Low Temperature ◽

Molecular Beam ◽

Critical Thickness ◽

Ellipsometric Study

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In situ ellipsometric study of the influence of powder formation on the initial growth of glow discharge a−Si:H

Thin Solid Films ◽

10.1016/0040-6090(93)90112-3 ◽

1993 ◽

Vol 233 (1-2) ◽

pp. 297-300 ◽

Author(s):

U.I. Schmidt ◽

B. Schröder ◽

H. Oechsner

Keyword(s):

Glow Discharge ◽

Initial Growth ◽

Powder Formation ◽

Ellipsometric Study

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In Situ Ellipsometric Study of PEG∕Cl[sup −] Coadsorption on Cu, Ag, and Au

Journal of The Electrochemical Society ◽

10.1149/1.1915271 ◽

2005 ◽

Vol 152 (6) ◽

pp. C403 ◽

Author(s):

M. L. Walker ◽

L. J. Richter ◽

T. P. Moffat

Keyword(s):

Ellipsometric Study

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Antibody–antigen interaction on polystyrene: An in situ ellipsometric study

Journal of Colloid and Interface Science ◽

10.1016/j.jcis.2011.11.034 ◽

2012 ◽

Vol 368 (1) ◽

pp. 533-539 ◽

Author(s):

Olof Svensson ◽

Thomas Arnebrant

Keyword(s):

Ellipsometric Study ◽

Antigen Interaction

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In situ Raman Monitoring of Competitive Adsorption of Ag and Au Nanoparticles onto a Poly(4-Vinyl Pyridine) Surface

Applied Spectroscopy ◽

10.1366/10-06054 ◽

2011 ◽

Vol 65 (1) ◽

pp. 60-65 ◽

Author(s):

Kwan Kim ◽

Hyunwoo Ryoo ◽

Kuan Soo Shin

Keyword(s):

Au Nanoparticles ◽

Competitive Adsorption ◽

In Situ Raman ◽

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In situ ATR–FTIR studies on the competitive adsorption of arsenate and phosphate on ferrihydrite

Journal of Colloid and Interface Science ◽

10.1016/j.jcis.2010.07.064 ◽

2010 ◽

Vol 351 (2) ◽

pp. 523-531 ◽

Author(s):

Ivan Carabante ◽

Mattias Grahn ◽

Allan Holmgren ◽

Jonas Hedlund

Keyword(s):

Competitive Adsorption ◽

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In Situ Ellipsometric Study of the Dependence of a-Si:H Film Growth on Substrate Properties and Ignition Procedures

MRS Proceedings ◽

10.1557/proc-336-85 ◽

1994 ◽

Vol 336 ◽

Author(s):

U.I. Schmidt ◽

W. Herbst ◽

B. Schröder ◽

H. Oechsner

Keyword(s):

Film Growth ◽

Particle Formation ◽

Bulk Film ◽

Layer Deposition ◽

Special Power ◽

Substrate Properties ◽

Ellipsometric Study ◽

Quality Material

ABSTRACTIn situ ellipsometry reveals that particle formation influences the growth of glow discharge a-Si:H. This particle formation is observed even under discharge conditions leading to the deposition of device quality Material. It is found that less dense material is deposited during the particle-induced initial transient stage of the discharge which influences the properties of the subsequently growing “bulk” film. The effect of special power gradient ignition procedures is discussed. A significant increase of solar cell efficency is achieved by choosing “soft” start conditions for the i-layer deposition.

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