Low-Temperature, Low-Pressure Chemical Vapor Deposition and Solid Phase Crystallization of Silicon–Germanium Films

2009 ◽  
Vol 156 (1) ◽  
pp. D23 ◽  
Author(s):  
Munehiro Tada ◽  
Jin-Hong Park ◽  
Jinendra Raja Jain ◽  
Krishna C. Saraswat
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Vapor Deposition ◽  
Silicon Germanium ◽  
Solid Phase ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Solid Phase Crystallization ◽  
Pressure Chemical ◽  
Germanium Films

Low‐temperature epitaxial growth of silicon by low‐pressure chemical vapor deposition

1988 ◽  
Vol 52 (13) ◽  
pp. 1053-1055 ◽  
Author(s):  
D. Meakin ◽  
M. Stobbs ◽  
J. Stoemenos ◽  
N. A. Economou
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Epitaxial Growth ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Pressure Chemical
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