scholarly journals Optical Properties of Spin-Coated TiO2Antireflection Films on Textured Single-Crystalline Silicon Substrates

2015 ◽  
Vol 2015 ◽  
pp. 1-8 ◽  
Author(s):  
Ryosuke Watanabe ◽  
Yohei Eguchi ◽  
Takuya Yamada ◽  
Yoji Saito
Keyword(s):  
Optical Properties ◽  
Crystalline Silicon ◽  
Low Cost ◽  
Incident Light ◽  
Antireflection Coating ◽  
Silicon Wafers ◽  
Reflectance Spectra ◽  
Visible Range ◽  
Single Crystalline Silicon ◽  
Single Crystalline

Antireflection coating (ARC) prepared by a wet process is beneficial for low cost fabrication of photovoltaic cells. In this study, we investigated optical properties and morphologies of spin-coated TiO2ARCs on alkaline textured single-crystalline silicon wafers. Reflectance spectra of the spin-coated ARCs on alkaline textured silicon wafers exhibit no interferences and low reflectance values in the entire visible range. We modeled the structures of the spin-coated films for ray tracing numerical calculation and compared numerically calculated reflectance spectra with the experimental results. This is the first report to clarify the novel optical properties experimentally and theoretically. Optical properties of the spin-coated ARCs without interference are due to the fractional nonuniformity of the thickness of the spin-coated ARCs that cancels out the interference of the incident light.

Surface-Texturing of Single-Crystalline Silicon Wafers

2011 ◽  
Vol 479 ◽  
pp. 124-131 ◽  
Author(s):  
Jian Yang Lin ◽  
Pai Yu Chang ◽  
Chih Kai Hu ◽  
Bin Hon Wu
Keyword(s):  
Solar Cells ◽  
Crystalline Silicon ◽  
Incident Light ◽  
Surface Texturing ◽  
Front Surface ◽  
Anisotropic Etching ◽  
Silicon Wafers ◽  
Surface Reflectance ◽  
Single Crystalline Silicon ◽  
Single Crystalline

In this work, alkaline-based anisotropic etchants, tetramethylammonium hydroxide (TMAH) and potassium hydroxide (KOH)/isopropyl alcohol (IPA) solutions, have been used for the surface texturing of the single-crystalline silicon wafers used for solar cells. The pyramid morphology produced by the surface texturing can reduce the surface reflection of the incident light and increase the light absorption so that the efficiency of the solar cells can be increased. The experimental data shows that the optimized surface texturing has been obtained with 5 wt. % TMAH anisotropic etching at 80 °C. The surface reflectance of the polished front surface can be reduced to 17 % and the surface reflectance of the unpolished backside surface can be reduced to 3 %, respectively. This result shows that the anisotropic etching can effectively reduce the surface reflectance. While for the surface texturing with KOH/IPA mixture, the front surface reflectance can only be reduced to 35 % and the backside surface reflectance can only be reduced to 5 %, respectively. Besides, debris of Si nano-crystals exists around the pyramid base area when texturing with the KOH/IPA mixture.

Recombination Characteristics of Single-Crystalline Silicon Wafers with a Damaged Near-Surface Layer

2013 ◽  
Vol 58 (2) ◽  
pp. 142-150 ◽  
Author(s):  
A.V. Sachenko ◽  
◽  
V.P. Kostylev ◽  
V.G. Litovchenko ◽  
V.G. Popov ◽  
...  
Keyword(s):  
Surface Layer ◽  
Crystalline Silicon ◽  
Silicon Wafers ◽  
Single Crystalline Silicon ◽  
Near Surface ◽  
Single Crystalline

scholarly journals Dislocation motion during rapid thermal processing of single-crystalline silicon wafers

2013 ◽  
Vol 62 (16) ◽  
pp. 168101
Author(s):  
Xu Ling-Mao ◽  
Gao Chao ◽  
Dong Peng ◽  
Zhao Jian-Jiang ◽  
Ma Xiang-Yang ◽  
...  
Keyword(s):  
Thermal Processing ◽  
Crystalline Silicon ◽  
Rapid Thermal Processing ◽  
Dislocation Motion ◽  
Silicon Wafers ◽  
Single Crystalline Silicon ◽  
Single Crystalline
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