Oxidation Behaviors of Aluminum Nanopowders with Different Particle Sizes: A Real-Time Synchrotron X-ray Scattering Study

2021 ◽  
Vol 21 (3) ◽  
pp. 1784-1788
Author(s):  
Nan-Nan Liang ◽  
Sae-Heum Park ◽  
Tae-Sik Cho

We have studied the oxidation behaviors of aluminum (Al) nanopowders with different particle sizes using a real-time synchrotron X-ray scattering during annealing in air. The Al nanopowders with small particle size of 78 nm at room temperature (RT) were a single crystal. The surface of the nanopowders was first oxidized to amorphous Al oxide near 450 °C, and then crystallized to γ-Al2O3 phase at 550 °C. The inside of the nanopowders existed as crystal Al phase at 680 °C, high compared to the melting temperature of Al bulk, 660 °C. In contrast, the Al nanopowders with large particle size of 816 nm at RT have multi grains inside a particle. The surface and grain boundary of the powders were first oxidized to amorphous Al oxide near 470 °C, and then crystallized to γ-Al2O3 phase at 550 °C. The inside of the powders existed as amorphous Al phase at 620 °C, melted at 656 °C, and then oxidized gradually above 656 °C.

2004 ◽  
Vol 22 (5) ◽  
pp. 2159-2162 ◽  
Author(s):  
I. W. Kim ◽  
Y. B. Kwon ◽  
J. M. Yi ◽  
J. H. Je ◽  
G. Nouet ◽  
...  

1999 ◽  
Vol 35 (5) ◽  
pp. 2778-2780 ◽  
Author(s):  
Tae Sik Cho ◽  
Seok Joo Doh ◽  
Jung Ho Je ◽  
Do Young Noh ◽  
Tak Jean Moon

1995 ◽  
Vol 28 (19) ◽  
pp. 6383-6393 ◽  
Author(s):  
Michael F. Butler ◽  
Athene M. Donald ◽  
Wim Bras ◽  
Geoffrey R. Mant ◽  
Gareth E. Derbyshire ◽  
...  

1991 ◽  
Vol 41 (1-2) ◽  
pp. 269
Author(s):  
T.A. Ezquerra ◽  
E. Lopez-Cabarcos ◽  
F.J. Baltà-Calleja ◽  
J.D. Stenger-Smith ◽  
R.W. Lenz

2002 ◽  
Vol 749 ◽  
Author(s):  
Hsin-Yi Lee ◽  
C.-H. Hsu ◽  
Y.-W. Hsieh ◽  
K. S. Liang

ABSTRACTThe real-time x-ray scattering measurements under in-situ sputtering conditions were employed to study the growth behavior of sputter-deposited SrTiO3 films on SrTiO3 (001) substrate. A condition for conformal growth between deposited layers and substrate was found by observing the oscillation fringe in the diffuse scattering of measured reflectivity. The azimuthal scan around surface Bragg peak of the film peak shows that the epitaxial relationship between film and substrate can be achieved by sputtering.


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