Fabrication of glass-capsuled CdTe microcrystals using laser evaporation and plasma chemical vapour deposition method

Journal of Materials Science ◽

10.1007/bf00975078 ◽

1994 ◽

Vol 29 (5) ◽

pp. 1295-1301

Author(s):

K. Tsunetomo ◽

S. Ohtsuka ◽

T. Koyama ◽

S. Tanaka

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Laser Evaporation ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Preparation of (Tl, Bi, Pb)-Sr-Ca-Cu-O superconducting thin films by the mist microwave plasma chemical vapour deposition method

Journal of Materials Science Letters ◽

10.1007/bf00422674 ◽

1995 ◽

Vol 14 (23) ◽

pp. 1681-1683

Author(s):

N. Takahashi ◽

A. Koukitu ◽

H. Seki

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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The temperature dependence of the resistance of diamond film synthesized by microwave plasma chemical vapour deposition method

Vacuum ◽

10.1016/0042-207x(91)91423-l ◽

1991 ◽

Vol 42 (16) ◽

pp. 1083

Author(s):

Yang Bangchao ◽

Gou Li ◽

Jia Yuming

Keyword(s):

Temperature Dependence ◽

Chemical Vapour Deposition ◽

Diamond Film ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Synthesis of cubic BN from the gas phase by a new plasma chemical vapour deposition method using r.f. waves and a tungsten filament

Surface and Coatings Technology ◽

10.1016/0257-8972(90)90066-l ◽

1990 ◽

Vol 43-44 ◽

pp. 116-127 ◽

Author(s):

Yukio Ichinose ◽

Hidetoshi Saitoh ◽

Yoshihiko Hirotsu

Keyword(s):

Gas Phase ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Method ◽

Tungsten Filament ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Development of the quadrupole plasma chemical vapour deposition method for low temperature, high speed coating on an optical fibre

Materials Science and Engineering A ◽

10.1016/0921-5093(91)90600-r ◽

1991 ◽

Vol 139 ◽

pp. 79-84 ◽

Author(s):

Takeshi Kashima ◽

Yoshinobu Matsuda ◽

Hiroshi Fujiyama

Keyword(s):

Low Temperature ◽

Chemical Vapour Deposition ◽

Optical Fibre ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Surface characterisation of carbon films produced by plasma chemical vapour deposition method

Surface Engineering ◽

10.1179/1743294413y.0000000137 ◽

2013 ◽

Vol 29 (6) ◽

pp. 474-478 ◽

Author(s):

A. Khettache ◽

T. Staedler ◽

M. Z. Touhami ◽

H. Weiß ◽

X. Jiang

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Deposition Method ◽

Plasma Chemical ◽

Surface Characterisation ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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SYNTHESIS OF CUBIC BN FROM THE GAS PHASE BY A NEW PLASMA CHEMICAL VAPOUR DEPOSITION METHOD USING R.F. WAVES AND A TUNGSTEN FILAMENT

Metallurgical Coatings and Thin Films 1990 ◽

10.1016/b978-1-85166-813-7.50020-6 ◽

1990 ◽

pp. 116-127

Author(s):

YUKIO ICHINOSE ◽

HIDETOSHI SAITOH ◽

YOSHIHIKO HIROTSU

Keyword(s):

Gas Phase ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Method ◽

Tungsten Filament ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Effects of Carrier Gas Transport on the Structure and Performanc e of Al-doped ZnO Films Grown by Aerosol-Assisted Chemical Vapour Deposition Method

Current Nanoscience ◽

10.2174/1573413713666170616085231 ◽

2017 ◽

Vol 13 (5) ◽

Author(s):

Lixin Wang ◽

Lin Lu ◽

Liqian Zhang ◽

Xiaojuan Wang ◽

Xiujuan Qin

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Gas Transport ◽

Chemical Vapour ◽

Zno Films ◽

Deposition Method ◽

Carrier Gas ◽

Doped Zno ◽

Chemical Vapour Deposition Method

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Effect of volume of the solution and sulfurization on properties of Cu2ZnSnS4 thin films fabricated by spray assisted chemical vapour deposition method

Materials Research Innovations ◽

10.1080/14328917.2021.1904627 ◽

2021 ◽

pp. 1-7

Author(s):

Samira Bouzida ◽

Manale Battas ◽

El Bachir Benamar ◽

Guy Schmerber ◽

Aziz Dinia ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Method ◽

Chemical Vapour Deposition Method

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Microwave plasma chemical vapour deposition of tetramethylsilane: correlations between optical emission spectroscopy and film characteristics

Surface and Coatings Technology ◽

10.1016/s0257-8972(01)01081-7 ◽

2001 ◽

Vol 142-144 ◽

pp. 314-320 ◽

Author(s):

L. Thomas ◽

L. Maillé ◽

J.M. Badie ◽

M. Ducarroir

Keyword(s):

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Optical Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Film Characteristics

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Localization of carriers of Y-doped CaCuO2 films prepared by an organometallic-chemical-vapour-deposition method

Journal of Materials Science ◽

10.1007/bf00356417 ◽

1993 ◽

Vol 28 (24) ◽

pp. 6699-6703 ◽

Author(s):

Kenkichiro Kobayashi ◽

Yozo Ishihara ◽

Shigenori Matsushima ◽

Genji Okada

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Method ◽

Chemical Vapour Deposition Method

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