Impact of Phase Flicker on the Performance of Multilevel Phase Holograms with Phase-Only LCOS Devices

2021 ◽  
Author(s):  
Yuan Tong ◽  
Mike Pivnenko ◽  
Daping Chu
Keyword(s):  
1988 ◽  
Vol 46 (2) ◽  
pp. 157-164 ◽  
Author(s):  
T. L�ckemeyer ◽  
H. Franke
Keyword(s):  

1982 ◽  
Vol 40 (3) ◽  
pp. 175-178 ◽  
Author(s):  
T.G. Pencheva ◽  
M.P. Petrov ◽  
S.I. Stepanov

2010 ◽  
Author(s):  
Mingxi Hu ◽  
Jindong Tian ◽  
Ruisong Wang ◽  
Dong Li

Author(s):  
Nathan J. Jenness ◽  
Kurt D. Wulff ◽  
Matthew S. Johannes ◽  
Daniel G. Cole ◽  
Robert L. Clark

Maskless patterning techniques are increasingly implemented in semiconductor research and manufacturing eliminating the need for costly masks or masters. Recent application of these techniques to DNA and cell patterning demonstrates the adaptability of maskless processes. In this paper we present a new lithographic process for dynamically reconfiguring and arbitrarily positioning computer-generated patterns through the use of phase holograms. Similar to current maskless patterning methods this process can achieve pattern transfer through serially tracing an image onto a substrate. The novelty of our process, however, lies in the ability to rapidly fabricate complex micro/nanoscale structures through single-shot exposure of a substrate.


1984 ◽  
Vol 16 (4) ◽  
pp. 369-372 ◽  
Author(s):  
C. W. Slinger ◽  
L. Solymar

1970 ◽  
Vol 9 (6) ◽  
pp. 1363 ◽  
Author(s):  
D. H. McMahon ◽  
W. T. Maloney

1974 ◽  
Vol 10 (1) ◽  
pp. 32-36 ◽  
Author(s):  
G.E. Scrivener ◽  
M.R. Tubbs

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