Writing 40-nm Marks Using a Beaked Metallic Plate Near-Field Optical Probe

2005 ◽  
Author(s):  
Takuya Matsumoto ◽  
Yumiko Anzai ◽  
Toshimichi Shintani ◽  
Kimio Nakamura ◽  
Tetsuya Nishida
Keyword(s):  
Near Field ◽  
Optical Probe ◽  
Metallic Plate

Writing 40 nm marks by using a beaked metallic plate near-field optical probe

2006 ◽  
Vol 31 (2) ◽  
pp. 259 ◽  
Author(s):  
T. Matsumoto ◽  
Y. Anzai ◽  
T. Shintani ◽  
K. Nakamura ◽  
T. Nishida
Keyword(s):  
Near Field ◽  
Optical Probe ◽  
Metallic Plate

Field distribution on metallic and dielectric nanoparticles observed with a fluorescent near-field optical probe

2005 ◽  
Vol 97 (10) ◽  
pp. 104322 ◽  
Author(s):  
L. Aigouy ◽  
M. Mortier ◽  
J. Giérak ◽  
E. Bourhis ◽  
Y. De Wilde ◽  
...  
Keyword(s):  
Field Distribution ◽  
Near Field ◽  
Optical Probe

PMN-PT piezoelectric near field optical probe for data storage

2006 ◽  
Author(s):  
Yong K. Hong ◽  
Sung Q. Lee ◽  
Eun Kyoung Kim ◽  
Kang Ho Park ◽  
Kee S. Moon
Keyword(s):  
Data Storage ◽  
Near Field ◽  
Optical Probe

Novel near-field optical probe for 100-nm critical dimension measurements

1997 ◽  
Author(s):  
Brian R. Stallard ◽  
Sumanth Kaushik
Keyword(s):  
Near Field ◽  
Critical Dimension ◽  
Optical Probe

Near-Field Optical Probe Based on the Fiber Fabry-Perot Interferometer with Protruding Evanescent Light Source

2014 ◽  
Vol 213 ◽  
pp. 204-209
Author(s):  
Aleksandr A. Kuchmizhak ◽  
Oleg B. Vitrik ◽  
Yuri N. Kulchin
Keyword(s):  
Light Source ◽  
Spatial Resolution ◽  
Near Field ◽  
Optical Probe ◽  
Fabrication Process ◽  
Fabry Perot ◽  
Evanescent Light

We studied numerically and experimentally the possibility of the development of a novel probe based on the fiber Fabry-Perot interferometer with an evanescent light source protruding directly toward the sample. It was shown that such probe provides a spatial resolution ~λ/40 for λ=1550 nm. The fabrication process of such a probe is described in detail.

MAPPING OF QUANTUM-HALL EDGE CHANNELS BY A DILUTION-REFRIGERATOR BASED NEAR-FIELD SCANNING OPTICAL MICROSCOPE

2010 ◽  
Vol 19 (04) ◽  
pp. 563-569
Author(s):  
H. ITO ◽  
K. FURUYA ◽  
Y. SHIBATA ◽  
Y. OOTUKA ◽  
S. NOMURA ◽  
...  
Keyword(s):  
Chemical Potential ◽  
Near Field ◽  
Quantum Hall ◽  
Sample Surface ◽  
Optical Microscope ◽  
Optical Probe ◽  
Real Space ◽  
Dilution Refrigerator ◽  
Dimensional Electron Gas ◽  
Near Field Scanning

A real-space mapping of photovoltage near the edge of the Hall-bar of a GaAs/AlGaAs single heterojunction has been obtained using a dilution-refrigerator-based near-field scanning optical microscope in magnetic fields. The optical probe-sample surface distance dependence of photovoltage is investigated. We obtain photovoltage profile in the vicinity of the edge, which reflects the local chemical potential of the two-dimensional electron gas determined by the distribution of the compressible and incompressible strips.

Evaluation of nano-optical probe from scanning near-field optical microscope images

1999 ◽  
Vol 194 (2-3) ◽  
pp. 369-373 ◽  
Author(s):  
Hosaka ◽  
Shintani ◽  
Kikukawa ◽  
Itoh
Keyword(s):  
Near Field ◽  
Optical Microscope ◽  
Optical Probe ◽  
Microscope Images

Near-Field Second Harmonic Microscopy of Thin Ferroelectric Films

1999 ◽  
Vol 596 ◽  
Author(s):  
I. I. Smolyaninov ◽  
H. Y. Liang ◽  
C. H. Lee ◽  
C. C. Davis ◽  
L. D. Rotter ◽  
...  
Keyword(s):  
Second Harmonic ◽  
Near Field ◽  
Laser System ◽  
Optical Resolution ◽  
Optical Probe ◽  
Ferroelectric Materials ◽  
Scanning Probe ◽  
Fast Time ◽  
Regenerative Amplifier ◽  
Time Resolved

AbstractNear-field second harmonic microscopy is ideally suited for studies of local nonlinearity and poling of ferroelectric materials at the microscopic level. Its main advantages in comparison with other scanning probe techniques are the possibility of fast time-resolved measurements, and substantially smaller perturbation of the sample under investigation caused by the optical probe. We report second harmonic imaging of the surface of thin BaTiO3 films obtained in a near-field microscopy setup using a Ti:sapphire laser system consisting of an oscillator and a regenerative amplifier operating at 810 nm. Optical resolution on the order of 80 nm has been achieved.

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