PIN-all carbon solar cell by microwave surface wave plasma CVD

2013 ◽  
Author(s):  
Dilip. C. Ghimire ◽  
S. Adhikari ◽  
S. Ichimura ◽  
H. Uchida ◽  
K. Wakita ◽  
...  
Keyword(s):  
Solar Cell ◽  
Surface Wave ◽  
Plasma Cvd

Photovoltaic Properties of a-C:N/p-Si Heterojunction Solar Cell Synthesized by Microwave Surface Wave Plasma CVD

2006 ◽  
Author(s):  
Sudip Adhikari ◽  
Hare Ram Aryal ◽  
Dilip C. Ghimire ◽  
Ashraf M.M. Omer ◽  
Sunil Adhikary ◽  
...  
Keyword(s):  
Solar Cell ◽  
Surface Wave ◽  
Heterojunction Solar Cell ◽  
Plasma Cvd ◽  
Photovoltaic Properties

Fluorine incorporated amorphous carbon thin films prepared by Surface Wave Microwave Plasma CVD

2008 ◽  
Vol 17 (7-10) ◽  
pp. 1697-1701 ◽  
Author(s):  
Golap Kalita ◽  
Hare Ram Aryal ◽  
Sudip Adhikari ◽  
Dilip C. Ghimire ◽  
Rakesh A. Afre ◽  
...  
Keyword(s):  
Thin Films ◽  
Surface Wave ◽  
Amorphous Carbon ◽  
Microwave Plasma ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd ◽  
Carbon Thin Films

Electrical conductivity improvement by iodine doping for diamond-like carbon thin-films deposited by microwave surface wave plasma CVD

2006 ◽  
Vol 15 (4-8) ◽  
pp. 645-648 ◽  
Author(s):  
Ashraf M.M. Omer ◽  
Sudip Adhikari ◽  
Sunil Adhikary ◽  
Mohamad Rusop ◽  
Hideo Uchida ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Conductivity ◽  
Surface Wave ◽  
Diamond Like Carbon ◽  
Plasma Cvd ◽  
Iodine Doping ◽  
Carbon Thin Films

Optical and structural properties of amorphous carbon thin films deposited by microwave surface-wave plasma CVD

2006 ◽  
Vol 15 (2-3) ◽  
pp. 188-192 ◽  
Author(s):  
Sudip Adhikari ◽  
Sunil Adhikary ◽  
Ashraf M.M. Omer ◽  
Mohamad Rusop ◽  
Hideo Uchida ◽  
...  
Keyword(s):  
Thin Films ◽  
Surface Wave ◽  
Structural Properties ◽  
Amorphous Carbon ◽  
Plasma Cvd ◽  
Carbon Thin Films

Photoconductivity effects of nitrogenated carbonaceous films grown on various types of substrates by surface wave microwave plasma CVD

2006 ◽  
Vol 90 (3) ◽  
pp. 301-307 ◽  
Author(s):  
M RUSOP ◽  
A OMER ◽  
S ADHIKARI ◽  
S ADHIKARY ◽  
H UCHIDA ◽  
...  
Keyword(s):  
Surface Wave ◽  
Microwave Plasma ◽  
Plasma Cvd ◽  
Microwave Plasma Cvd

Improved Stability of Hydrogenated Amorphous Silicon Solar Cells Fabricated by Triode-Plasma CVD

2005 ◽  
Vol 862 ◽  
Author(s):  
H. Sonobe ◽  
A. Sato ◽  
T. Fujibayashi ◽  
S. Shimizu ◽  
T. Matsui ◽  
...  
Keyword(s):  
Solar Cells ◽  
Solar Cell ◽  
Amorphous Silicon ◽  
Hydrogenated Amorphous Silicon ◽  
Plasma Cvd ◽  
Plate Electrode ◽  
Bond Density ◽  
Degradation Ratio ◽  
Improved Stability ◽  
Hydrogenated Amorphous

AbstractWe have employed a triode-type plasma CVD system to fabricate highly stabilized hydrogenated amorphous silicon (a-Si:H) solar cells. The p-i-n type solar cells were fabricated on a textured SnO2/glass substrate (ASAHI VU type). By applying a triode system, the Si-H2 bond density in the film decreased to about one third (from 1.7 at.% for conventional parallel-plate-electrode to 0.6 at.% for a triode configuration), and correspondingly the degradation ratio decreased from 13 % to 10 %. We have achieved the degradation ratio of 5 % by optimizing the player deposition conditions. In case of a triode system, there were minor effects of higher hydrogen dilution in the stabilized efficiency. We have experimented the effects of the substrate temperature for a higher stabilized efficiency. Further improvement in solar efficiency has been made by applying antireflection layers to air/glass and TCO/p interfaces. As a result, we have achieved the stabilized efficiency of 9.22 % (Jsc = 15.9 mA/cm2, Voc = 0.863 V, FF = 0.672) with a degradation ratio of 7.8 %. We have also employed the triode-deposited a-Si:H solar cell to a tandem type solar cell with a structure of a-Si:H/hydrogenated microcrystalline silicon (μc-Si:H). We have achieved the stabilized efficiency of 10.9 % (Jsc = 12.0 mA/cm2, Voc = 1.31 V, FF = 0.691) with a degradation ratio of 7.3 %.

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