Al-2.136 Top-Surface Imaging (Tsi)

2021 ◽  
Author(s):  
Richard G. Jones ◽  
Christopher K. Ober ◽  
Teruaki Hayakawa ◽  
Christine K. Luscombe ◽  
Natalie Stingelin
Keyword(s):  
Surface Imaging ◽  
Top Surface Imaging

A Study of the O2-SO2Plasma Etch Chemistry for Top Surface Imaging Photoresist Dry Development

1998 ◽  
Vol 37 (Part 1, No. 4B) ◽  
pp. 2373-2380 ◽  
Author(s):  
Z. S. Huang ◽  
Yosias Melaku ◽  
Wendy Nguyen
Keyword(s):  
Surface Imaging ◽  
Top Surface Imaging

Top-Surface Imaging Using Selective Electroless Metallization of Patterned Monolayer Films

1993 ◽  
pp. 210-219 ◽  
Author(s):  
J. M. Calvert ◽  
W. J. Dressick ◽  
C. S. Dulcey ◽  
M. S. Chen ◽  
J. H. Georger ◽  
...  
Keyword(s):  
Surface Imaging ◽  
Monolayer Films ◽  
Electroless Metallization ◽  
Top Surface Imaging

Using alicyclic polymers in top surface imaging systems to reduce line-edge roughness

2000 ◽  
Author(s):  
Mark H. Somervell ◽  
David S. Fryer ◽  
Brian Osborn ◽  
Kyle Patterson ◽  
Sungseo Cho ◽  
...  
Keyword(s):  
Imaging Systems ◽  
Surface Imaging ◽  
Line Edge Roughness ◽  
Edge Roughness ◽  
Top Surface Imaging

scholarly journals Top Surface Imaging for Extreme Ultraviolet Lithography.

1998 ◽  
Vol 11 (3) ◽  
pp. 459-464 ◽  
Author(s):  
Craig Henderson ◽  
David Wheeler ◽  
Timothy Pollagi ◽  
Greg Cardinale ◽  
Donna O'Connell ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Surface Imaging ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Top Surface Imaging

Electrical property study of line-edge roughness in top surface imaging process by silylation

1999 ◽  
Author(s):  
Myoung-Soo Kim ◽  
Hyoung-Gi Kim ◽  
Seung Ho Pyi ◽  
Hyeong-Soo Kim ◽  
Ki-Ho Baik ◽  
...  
Keyword(s):  
Electrical Property ◽  
Surface Imaging ◽  
Line Edge Roughness ◽  
Edge Roughness ◽  
Top Surface Imaging

Dry Development for 0.25 μm Top Surface Imaging

1997 ◽  
Vol 144 (7) ◽  
pp. 2461-2467 ◽  
Author(s):  
J. Vertommen ◽  
A. M. Goethals
Keyword(s):  
Surface Imaging ◽  
Top Surface Imaging

0.25-μm lithography development using positive mode top surface imaging photoresist

1994 ◽  
Author(s):  
Douglas C. LaTulipe ◽  
John P. Simons ◽  
David E. Seeger ◽  
Leo L. Linehan
Keyword(s):  
Surface Imaging ◽  
Positive Mode ◽  
Top Surface Imaging
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