scholarly journals Fundamental Research on the Structure and Properties of Electroerosion-Resistant Coatings on Copper

2021 ◽  
Vol 22 (2) ◽  
pp. 204-249
Author(s):  
D. A. Romanov ◽  
V. V. Pochetukha ◽  
V. E. Gromov ◽  
K. V. Sosnin
Keyword(s):  
Electron Microscopy ◽  
Atomic Force Microscopy ◽  
High Speed ◽  
Spherical Particles ◽  
Second Phase ◽  
Silver Foil ◽  
Electrical Networks ◽  
Force Microscopy ◽  
Atomic Force ◽  
Electrical Erosion

The electroerosion-resistant coatings of CuO–Ag and ZnO–Ag systems were obtained on the Cu surface. The formation of the coating was caused by the processing of copper surface with a plasma formed in the electrical explosion of silver foil with a weighed sample of copper oxide or zinc oxide. After electroexplosion spraying, the electron-beam treatment of coatings was performed. The nanohardness, Young modulus, wear resistance, friction coefficient, and electrical erosion resistance of the formed coatings were studied. All studied properties exceed those of copper. Electrical erosion coatings were studied by the methods of scanning electron microscopy, transmission electron microscopy, and atomic force microscopy. It became possible to achieve the high level of operational properties of electrical erosion coatings due to their nanostructurization. Structure of coating is formed by cells of high-speed crystallization. The size of cells varies within the range from 150 nm to 400 nm. The cells are separated by interlayers of the second phase whose thickness varies as 15–50 nm. By method of atomic force microscopy, the separate particles of ZnO or CuO of different shapes and 10–15 nm in size chaotically located in silver matrix were revealed as well as spherical particles of ZnO or CuO in size of 2–5 nm. The total thickness of coatings is 60 μm. The complex of studies we have carried out permits to recommend the integrated processing for strengthening the switch copper contacts of powerful electrical networks.

scholarly journals Physical characterisation of microporous and nanoporous polymer films by atomic force microscopy, scanning electron microscopy and high speed video microphotography

2004 ◽  
Vol 18 (4) ◽  
pp. 577-585 ◽  
Author(s):  
M. S. Barrow ◽  
R. L. Jones ◽  
J. O. Park ◽  
M. Srinivasarao ◽  
P. R. Williams ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Atomic Force Microscopy ◽  
Polymer Solution ◽  
Polymer Films ◽  
High Speed ◽  
Water Droplets ◽  
Force Microscopy ◽  
Atomic Force ◽  
Scanning Electron

We report studies of ordered microporous and nanoporous polymer films formed by the evaporation of polymer solutions following exposure to a humid atmosphere. High speed microphotographic (HSMP) studies of the formation process showed that near the surface of the polymer solution, vapour condensation produced near mono-disperse water droplets which form a close-packed monolayer (or ‘breath figure’). Following the evaporation of the solvent, characterisation of the solid by Atomic Force Microscopy and Scanning Electron Microscopy revealed that the surface of the polymer film is characterised by extensive regions of hexagonally close-packed microscopic pores, whose spatial arrangement replicates that of the initial droplet monolayer. Characterisation of sections of the film by Atomic Force Microscopy established that the surficial pores represent open sections of sub-surficial spheroidal cavities formed by encapsulation of the water droplets within the polymer solution. An interesting feature of the results is the occurrence of nano-scale pores at the film surface and at (and within) the walls of the sub-surficial microscopic pores. This is the first physical evidence report of such features in porous polymer films produced by a process involving breath-figures. Their dimensions suggest that more detailed structural investigations will require alternative techniques to conventional, optical methods.

High-Speed Atomic Force Microscopy Enables New Applications

2011 ◽  
Vol 19 (6) ◽  
pp. 12-15 ◽  
Author(s):  
Lars Mininni ◽  
Andrea Slade ◽  
Johannes Kindt ◽  
Shuiqing Hu
Keyword(s):  
Electron Microscopy ◽  
Atomic Force Microscopy ◽  
High Speed ◽  
Force Microscopy ◽  
User Adoption ◽  
Minimal Sample ◽  
Atomic Force ◽  
Wide Range ◽  
Order Of Magnitude ◽  
New Applications

Atomic force microscopy (AFM) is one of the most powerful and dynamic methods for performing nanoscale imaging and materials characterization, enabling scientists and researchers to attain atomic resolution and measure nano-mechanical material properties in-situ, all while requiring minimal sample preparation. In spite of these clear advantages, user adoption of AFM has been limited by the technique's slow imaging speed as compared to light microscopy, scanning electron microscopy (SEM), and transmission electron microscopy (TEM). However, recent advances in AFM technology have increased AFM imaging speeds by over an order of magnitude, opening up a wide range of new applications while greatly improving the user experience.

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