International Journal of Chemistry wishes to acknowledge the following individuals for their assistance with peer review of manuscripts for this issue. Their help and contributions in maintaining the quality of the journal is greatly appreciated. Many authors, regardless of whether International Journal of Chemistry publishes their work, appreciate the helpful feedback provided by the reviewers.Reviewers for Volume 10, Number 3 Abdul Rouf Dar, University of Florida, USAAhmad Galadima, Usmanu Danfodiyo University, NigeriaAhmet Ozan Gezerman, Yildiz Technical University, TurkeyAsghari Gul, Comsats IIT, PakistanAyodele Temidayo Odularu, University of Fort Hare, South AfricaGreg Peters, University of Findlay, USAK. Ishara Silva, Rensselaer Polytechnic Institute, USAKhaldun Mohammad Al Azzam, Batterjee Medical College for Sciences and Technology, Saudi ArabiaLaila A. Abouzeid, Mansoura University, EgyptMadduri Srinivasarao, Purdue University, USAMaolin Lu, Yale University, USAMohamed Abass, Ain Shams University, EgyptMustafa Oguzhan Kaya, Siirt University, TurkeyNanda Gunawardhana, Saga University, JapanNejib Hussein Mekni, Al Manar University, TunisiaNisha Saxena, Galgotias College of Engineering and Technology, IndiaPrathapan Sreedharan, Cochin University, IndiaPraveen Kumar, Texas Tech University, USAPriyanka Singh, University of Iowa, USAQun Ye, Institute of Materials Reseach and Engineering, SingaporeR. K. Dey, Birla Institute of Technology (BIT), IndiaRodrigo Vieira Rodrigues, University of São Paulo, BrazilSyed A. A. Rizvi, Nova Southeastern University, USAThirupathi Barla, Harvard University, USAVijay Ramalingam, Columbia University, USA Albert JohnOn behalf of,The Editorial Board of International Journal of ChemistryCanadian Center of Science and Education
Research Group Introduction : Power System Laboratory, Department of Electrical Engineering, College of Engineering, Shibaura Institute of Technology