Study of defects and structural transformations induced by ion irradiation of Y2O3 thin films deposited by Ion Beam Sputtering

2008 ◽  
Vol 1122 ◽  
Author(s):  
Bertrand Lacroix ◽  
Fabien Paumier ◽  
Michael Jublot ◽  
Jérôme Pacaud ◽  
Rolly J. Gaboriaud
Keyword(s):  
Thin Films ◽  
Phase Transition ◽  
Ion Irradiation ◽  
Ion Beam ◽  
Structural Transformations ◽  
Deposition Technique ◽  
Ion Beam Sputtering ◽  
Ion Energy ◽  
Beam Sputtering ◽  
Different Doses

AbstractY2O3 thin films deposited by Ion Beam Sputtering (IBS) deposition technique exhibit a particular disordered microstructure. In order to obtain a better knowledge on phase transition mechanisms occurring during irradiation, thin films with different microstructures have been implanted with xenon ions at different energies and different doses. This work established two types of transition (cubic-amorphous or cubic-monoclinic) depending mainly on the ion energy with a possibility to control the damaging kinetic via the pre-existing oxygen disorder.

Nitrogen‐ion irradiation during the deposition of C1−xNx thin films by ion beam sputtering technique

1996 ◽  
Vol 14 (3) ◽  
pp. 777-780 ◽  
Author(s):  
Satoshi Kobayashi ◽  
Keiko Miyazaki ◽  
Shinji Nozaki ◽  
Hiroshi Morisaki ◽  
Shigeo Fukui ◽  
...  
Keyword(s):  
Thin Films ◽  
Ion Irradiation ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Nitrogen Ion

Effect of Concurrent Ion Bombardment on Structure and Composition of Ion Sputter-Deposited Ni-Ti Thin Films

1992 ◽  
Vol 268 ◽  
Author(s):  
D. S. Grummon ◽  
L. Chang
Keyword(s):  
Thin Films ◽  
Ion Irradiation ◽  
Incidence Angle ◽  
Ion Beam ◽  
Alloy Film ◽  
Ion Beam Sputtering ◽  
Ion Beam Assisted Deposition ◽  
R Ratio ◽  
Beam Sputtering ◽  
Argon Ions

ABSTRACTThin films of approximately equiatomic NiTi have been produced by ion beam sputtering, and by ion beam assisted deposition (IBAD), using 0.1 and 0.5 keV argon ions at fluences giving ion/atom arrival ratios (R-ratios) ranging between 0.26 and 2.21. Ion beam sputtering produced amorphous films which showed several percent titanium loss relative to the alloy target composition. Concurrent irradiation of the growing films with argon ions accentuated the titanium depletion, and R-ratios greater than approximately 1.4 at an assist-beam energy of 0.5keV produced resputtering rates that exceeded the deposition rate. Analysis of experiments with assist-beam energies of 0.5 keV produced a value of 1.75 for εTi/εNi, the ratio of sputteryields for titanium and nickel, in an amorphous alloy film at approximately 325K. Though data for 0.1 keV assist-beam irradiation could be interpreted to yield a similar value for εTi/εNi, resputtering at these energies displayed unexpected dependencies on R-ratio, and is apparently sensitive to the assist-beam incidence angle as well as the R-ratio. No evidence of crystallization of the films was found for the R-ratios examined. However, concurrent ion irradiation produced phenomenological evidence of short range ordering. Nanophase precipitates observed in TEM foils from films produced by ion beam assisted deposition, discovered in previous work and there identified as Ni3Ti, have been found in fact to be titanium nitride.

Preparation of thin films of (Tb,Dy)Fe2 giant magnetostrictive alloy by ion beam sputtering process.

1996 ◽  
Vol 8 (1/2) ◽  
pp. 27-28
Author(s):  
Mitsuhiro WADA ◽  
Yoshihito MATSUMURA ◽  
Hirohisa UCHIDA ◽  
Haru-Hisa UCHIDA ◽  
Hideo KANEKO
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

scholarly journals Fabrication of the Ln-Ba-Cu-O thin films by ion beam sputtering.

Shinku ◽  
1989 ◽  
Vol 32 (3) ◽  
pp. 259-262
Author(s):  
Tetsuro TAJIMA ◽  
Hajime KUWAHARA ◽  
Kohei OTANI ◽  
Tsutom YOTSUYA ◽  
Yoshihiko SUZUKI ◽  
...  
Keyword(s):  
Thin Films ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering
Sign in / Sign up

Export Citation Format

Share Document