First-principles Modeling of Structure, Vibrations, Electronic Properties and Bond Dynamics in Hydrogenated Amorphous Silicon: Theory versus Experiment

2009 ◽  
Vol 1153 ◽  
Author(s):  
Anatoli Shkrebtii ◽  
Ihor Kupchak ◽  
Franco Gaspari

AbstractWe carried out extensive first-principles modeling of microscopic structural, vibrational, electronic properties and chemical bonding in hydrogenated amorphous silicon (a-Si:H) in a wide range of hydrogen concentration and preparation conditions. The theory has been compared with experimental results to comprehensively characterize this semiconductor material. The computer modeling includes ab-initio Molecular Dynamics (MD), atomic structure optimization, advanced signal processing and computer visualization of dynamics. We extracted parameters of hydrogen and silicon bonding, electron charge density and calculated electron density of states (EDOS) and hydrogen diffusion. A good agreement of the theory with various experiments allowed us to correlate microscopic processes at the atomic level with macroscopic properties. Here we focus on correlation of the amorphous structure of the material, atom dynamics and electronic properties. These results are of increasing interest due to extensive application of a-Si:H in modern research and technology and to the significance of detailed understanding of the material structure, bonding, disordering mechanisms and stability.

1992 ◽  
Vol 258 ◽  
Author(s):  
Sufi Zafar ◽  
E. A. Schiff

ABSTRACTA model for correlating the observed properties of hydrogenated amorphous silicon (a-Si:H) with the underlying hydrogen microstructure is reviewed. The model provides a unified description of defect equilibration, hydrogen evolution, rehydrogenation and hydrogen diffusion measurements.


1995 ◽  
Vol 377 ◽  
Author(s):  
A. J. Franzi ◽  
M. Mavrikakis ◽  
J. W. Schwank ◽  
J. L. Gland

ABSTRACTHydrogen bulk mobility plays an important role in determining a wide range of materials and electronic properties of hydrogenated amorphous silicon (a-Si:H). The existence of two types of hydrogen traps plays an important role in controlling hydrogen mobility in, and evolution of hydrogen from a-Si:H, however, theoretical and experimental literature values for the trap energetics vary considerably. We have developed a mean-field reaction-diffusion model which explicitly includes two trap states and realistic surface processes to model hydrogen evolution from a-Si:H. Modern numerical techniques were required to solve this challenging problem over the wide range of temperatures and concentrations encountered in typical hydrogen evolution experiments. The model is based on a number of experimentally established parameters. Comparison of our rigorous model with temperature programmed hydrogen evolution experiments provides a powerful method for characterizing the energetics, trap concentrations and diffusivity of hydrogen in a-Si:H.


2014 ◽  
Vol 92 (7/8) ◽  
pp. 586-588 ◽  
Author(s):  
Y. Kitani ◽  
T. Maeda ◽  
S. Kakimoto ◽  
K. Tanaka ◽  
R. Okumoto ◽  
...  

Boron-doping characteristics in hydrogenated amorphous silicon–oxygen alloys (a-SiO:H) have been studied in contrast to those in hydrogenated amorphous silicon (a-Si:H). Although the boron-incorporation efficiency shows almost the same value between a-SiO:H and a-Si:H, p-type a-SiO:H (p-a-SiO:H) exhibits lower dark conductivity by one or two orders of magnitude as compared to p-type a-Si:H (p-a-Si:H) in a wide range of doping levels. We have found that p-a-SiO:H exhibits low dark conductivity as compared to p-a-Si:H even when we choose samples showing the same activation energy from a variety of as-deposited and thermally annealed samples. We have concluded from the different Urbach-energy values between high quality intrinsic a-SiO:H and a-Si:H that the origin of low dark conductivity in p-a-SiO:H is due to low hole mobility.


1992 ◽  
Vol 283 ◽  
Author(s):  
Masanori Otobe ◽  
Shunri Oda

ABSTRACTWe have investigated nucleation and growth mechanism of nanocrystalline silicon (nc-Si) based on the experimental observation of plan-view transmission electron microscopy. Nanocrystalline Si has been prepared by hydrogen radical annealing of hydrogenated amorphous silicon (a-Si:H) layer, which is deposited on hydrogen radical treated a-Si:H buffer layer. Nanocrystallization depends critically upon hydrogen radical annealing time and the thickness ofa-Si:H layer. Hydrogen radicals play important roles in both nucleation and growth processes in a different way. Growth of nc-Si can be explained by “hydrogen diffusion model”, in which hydrogen radicals diffusing through a-Si:H layer to interface cause nanocrystallization. Our results imply that nuclei for nc-Si are generated at the interface between a-Si:H and under layer when treated by hydrogen radicals.


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