Фотофизические свойства тонких пленок перилена, модифицированного функциональными группами диангидрида и диимида тетракарбоновой кислоты

The morphology of organic semiconductor films of perylenetetracarboxylic acid dianhydride (PTCDA) and perylenetetracarboxylic acid dibenzyl-diimide (N, N`-DBPTCDI) formed by thermal vacuum deposition was studied by atomic force microscopy. It was shown that annealing of films at 420 K leads to rearrangement of their structure and crystallization. The optical absorption spectra of the films under study were used to estimate the optical band gap. The temperature dependence of the dark conductivity of PTCDA and N, N-DBPTCDI films before and after annealing (Т = 420 K) was established. The values of the activation energy of charge carrier traps are determined. The computer simulation of the density of localized states in the band gap of the films studied was carried out using the photoconductivity spectra in the constant photocurrent mode. Model photovoltaic cells based on PTCDA / СuPc and N, N-DBPTCDI / СuPc structures were formed. The kinetics of decay of the interfacial photo-voltage of the cells prepared was measured using pulsed light as an excitation source. On the basis of the performed measurements, the charge carrier mobility values in the investigated semiconductor materials were estimated.

Terahertz Conductivity Analysis for Highly Doped Thin-Film Semiconductors

The analysis of terahertz transmission through semiconducting thin films has proven to be an excellent tool for investigating optoelectronic properties of novel materials. Terahertz time-domain spectroscopy (THz-TDS) can provide information about phonon modes of the crystal, as well as the electrical conductivity of the sample. When paired with photoexcitation, optical-pump-THz-probe (OPTP) technique can be used to gain an insight into the transient photoconductivity of the semiconductor, revealing the dynamics and the mobility of photoexcited charge carriers. As the relation between the conductivity of the material and the THz transmission function is generally complicated, simple analytical expressions have been developed to enable straightforward calculations of frequency-dependent conductivity from THz-TDS data in the regime of optically thin samples. Here, we assess the accuracy of these approximated analytical formulas in thin films of highly doped semiconductors, finding significant deviations of the calculated photoconductivity from its actual value in materials with background conductivity comparable to 102Ω− 1cm− 1. We propose an alternative analytical expression, which greatly improves the accuracy of the estimated value of the real photoconductivity, while remaining simple to implement experimentally. Our approximation remains valid in thin films with high dark conductivity of up to 104Ω− 1cm− 1 and provides a very high precision for calculating photoconductivity up to 104Ω− 1cm− 1, and therefore is highly relevant for studies of photoexcited charge-carrier dynamics in electrically doped semiconductors. Using the example of heavily doped thin films of tin-iodide perovskites, we show a simple experimental method of implementing our correction and find that the commonly used expression for photoconductivity could result in an underestimate of charge-carrier mobility by over 50%.

Transferless Inverted Graphene/Silicon Heterostructures Prepared by Plasma-Enhanced Chemical Vapor Deposition of Amorphous Silicon on CVD Graphene

The heterostructures of two-dimensional (2D) and three-dimensional (3D) materials represent one of the focal points of current nanotechnology research and development. From an application perspective, the possibility of a direct integration of active 2D layers with exceptional optoelectronic and mechanical properties into the existing semiconductor manufacturing processes is extremely appealing. However, for this purpose, 2D materials should ideally be grown directly on 3D substrates to avoid the transferring step, which induces damage and contamination of the 2D layer. Alternatively, when such an approach is difficult—as is the case of graphene on noncatalytic substrates such as Si—inverted structures can be created, where the 3D material is deposited onto the 2D substrate. In the present work, we investigated the possibility of using plasma-enhanced chemical vapor deposition (PECVD) to deposit amorphous hydrogenated Si (a-Si:H) onto graphene resting on a catalytic copper foil. The resulting stacks created at different Si deposition temperatures were investigated by the combination of Raman spectroscopy (to quantify the damage and to estimate the change in resistivity of graphene), temperature-dependent dark conductivity, and constant photocurrent measurements (to monitor the changes in the electronic properties of a-Si:H). The results indicate that the optimum is 100 °C deposition temperature, where the graphene still retains most of its properties and the a-Si:H layer presents high-quality, device-ready characteristics.

Изменения фотоэлектрических свойств нелегированных пленок аморфного гидрированного кремния под влиянием предварительного освещения при повышенных температурах

The effect of preliminary weak illumination at elevated temperatures on the photoelectric properties of undoped α-Si:H films is investigated. It is found that the dark conductivity and photoconductivity of films increases with the preliminary-illumination intensity, and the parameter γ determining the dependence of the photoconductivity on the illumination intensity decreases due to an increasing fraction of the bimolecular recombination of electrons at energy levels of the tail of the density of states of the conduction band. It is assumed that this effect may be induced by the presence of an uncontrolled oxygen impurity and an increase in the concentration of electrically active oxygen as a result of preliminary illumination of the films at elevated temperatures.

Structure and Optical Properties of Co-Sputtered Amorphous Silicon Tin Alloy Films for NIR-II Region Sensor

Near-infrared brain imaging technology has great potential as a non-invasive, real-time inspection technique. Silicon-tin (SiSn) alloy films could be a promising material for near-infrared brain detectors. This study mainly reports on the structure of amorphous silicon tin alloy thin films by Raman spectroscopy to investigate the influence of doped-Sn on an a-Si network. The variations in TO peak caused by the increase in Sn concentration indicate a decrease in the short-range order of the a-Si network. A model has been proposed to successfully explain the non-linear variation in Raman parameters of ITA/ITO and ILA+LO/ITO. The variations of Raman parameters of the films with a higher deposition temperature indicate the presence of SiSn nanocrystals, though the SiSn nanocrystals present no Raman peaks in Raman spectra. XRD and TEM analysis further illustrate the existence of nanocrystals. The ratio of photo/dark conductivity and optical bandgap results demonstrate that the films can be selected as a sensitive layer material for NIR-II region sensors.

Annealing of Boron-Doped Hydrogenated Crystalline Silicon Grown at Low Temperature by PECVD

We investigate low-temperature (<200 °C) plasma-enhanced chemical vapor deposition (PECVD) for the formation of p–n junctions. Compared to the standard diffusion or implantation processes, silicon growth at low temperature by PECVD ensures a lower thermal budget and a better control of the doping profile. We previously demonstrated the successful growth of boron-doped epitaxial silicon layers (p+ epi-Si) at 180 °C. In this paper, we study the activation of boron during annealing via dark conductivity measurements of p+ epi-Si layers grown on silicon-on-insulator (SOI) substrates. Secondary Ion Mass Spectroscopy (SIMS) profiles of the samples, carried out to analyze the elemental composition of the p+ epi-Si layers, showed a high concentration of impurities. Finally, we have characterized the p+ epi-Si layers by low-temperature photoluminescence (PL). Results revealed the presence of a broad defect band around 0.9 eV. In addition, we observed an evolution of the PL spectrum of the sample annealed at 200 °C, suggesting that additional defects might appear upon annealing.