Properties of Diamond-Like Carbon for Thin Film Microcathodes for Field Emission Displays

MRS Proceedings ◽

10.1557/proc-424-381 ◽

1996 ◽

Vol 424 ◽

Cited By ~ 3

Author(s):

J Robertson ◽

W I Milne

Keyword(s):

Thin Film ◽

Field Emission ◽

Electron Affinity ◽

Diamond Like Carbon ◽

Emission Properties ◽

Field Emission Properties ◽

Field Emission Displays ◽

Chemical Inertness ◽

Strong Candidate

AbstractDiamond-like carbon is a strong candidate for field emission microcathodes for field emission displays because of its low electron affinity and chemical inertness. The field emission properties of various types of diamond-like carbon such as a-C:H and ta-C are reviewed in the framework of a bonding model of their affinity.

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Barrier Height Difference Induced by Surface Terminations for Field Emission from P-doped Diamond

MRS Proceedings ◽

10.1557/proc-1039-p15-12 ◽

2007 ◽

Vol 1039 ◽

Author(s):

Yuki Kudo ◽

Takatoshi Yamada ◽

Hisato Yamaguchi ◽

Tomoaki Masuzawa ◽

Ichitaro Saito ◽

...

Keyword(s):

Barrier Height ◽

Field Emission ◽

Electron Affinity ◽

Height Ratio ◽

Height Difference ◽

Emission Properties ◽

Field Emission Properties ◽

Voltage Drops

AbstractIn this paper, we measured the field emission properties of reconstructed P-doped diamond under various anode-diamond distances and compared with the oxidized surface. Voltage drops in the vacuum was estimated to be 4.95 and 26.6 V/μm for the reconstructed and the oxidized, respectively. Moreover, we calculated the barrier height ratio between each surface. Our data indicates the changes in electron affinity strongly affect on the field emission properties.

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Effect of plasma-to-film interaction on electron field emission properties of pulsed laser deposited diamond-like-carbon films

Applied Surface Science ◽

10.1016/s0169-4332(98)00647-3 ◽

1999 ◽

Vol 142 (1-4) ◽

pp. 490-493

Author(s):

Hsiu-Fung Cheng ◽

Jain-Gong Kao ◽

Tzay-Shing Lai

Keyword(s):

Field Emission ◽

Pulsed Laser ◽

Carbon Films ◽

Diamond Like Carbon ◽

Electron Field Emission ◽

Emission Properties ◽

Field Emission Properties ◽

Electron Field ◽

Electron Field Emission Properties

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Surfacial Metallization of Carbon Fibers by Copper Coating and Field Emission Properties

Materials Science Forum ◽

10.4028/www.scientific.net/msf.663-665.183 ◽

2010 ◽

Vol 663-665 ◽

pp. 183-186 ◽

Cited By ~ 2

Author(s):

Lan Yang ◽

Yun Ye ◽

Tai Liang Guo ◽

Xiao Jin Huang

Keyword(s):

Thin Film ◽

Film Thickness ◽

Field Emission ◽

Carbon Fibers ◽

Applied Voltage ◽

Volume Resistivity ◽

Copper Coating ◽

Emission Properties ◽

Field Emission Properties ◽

Metal Thickness

Carbon fibers (CNFs) were surfacial metallized by electroless deposited with copper, and their field emission properties were investigated by diode test. The results indicated that the field emission properties of CNFs were affected by the thicknesses of copper. After CNFs were surfacial metallized, the volume resistivity of CNFs was decreased and field emission property was increased, respectively; increase the thin-film thickness, there appeared an optimal film thickness value for properties of field electron emission. It was found that CNFs owned the best field emission properties after electroless depositing for 15 min, with copper metal thickness as 2.1 µm and the volume resistivity down to 2.3510-4 Ω•cm. The field emission tests showed when applied voltage was 562 V, CNFs appeared bright dots, and the high luminance achieved 1388 cd/m2 under applied voltage 1013 V. Further more theoretical analyses, copper coating on CNFs surface is attributed to good electric conductivity, the low work function and the lower attenuation of electron scattering in thin-film.

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