Well Thickness And Doping Effects, And Room Temperature emission mechanisms in InGaN/GaN And GaN/AlGaN Multiple Quantum Wells
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AbstractEffects of well thickness and Si-doping on the photoluminescence (PL) emission properties of GaN/AlxGa1-xN (x ∼ 0.07) and InxGa1-xN/GaN (x ∼ 0.15–0.2) multiple quantum wells (MQWs) grown both by MOCVD and reactive MBE have been studied. The room temperature emission mechanisms have also been addressed.
2007 ◽
Vol 40
(21)
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pp. 6541-6544
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2010 ◽
Vol 49
(4)
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pp. 04DG07
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2000 ◽
Vol 36
(9)
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pp. 1013-1015
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1995 ◽
Vol 34
(Part 1, No. 2B)
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pp. 1279-1281
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