2015 15th International Workshop on Junction Technology (IWJT)
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9784863485174
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High temperature ion implanter for SiC and Si devices

2015 ◽  
Author(s):  
Naoya Takahashi ◽  
Suguru Itoi ◽  
Yoshiki Nakashima ◽  
WeiJiang Zhao ◽  
Hiroshi Onoda ◽  
...  
Keyword(s):  
High Temperature

Crystallization of amorphous silicon on glass substrate by microwave annealing for thin-film-transistor applications

2015 ◽  
Author(s):  
Chaochao Fu ◽  
Yan Wang ◽  
Peng Xu ◽  
Yeong Oh ◽  
David Wei Zhang ◽  
...  
Keyword(s):  
Thin Film ◽  
Amorphous Silicon ◽  
Glass Substrate ◽  
Thin Film Transistor ◽  
Microwave Annealing

Recent developments on PULSION® PIII tool: FinFET 3D doping, high temp implantation, III-V doping, contact and silicide improvement, & 450 mm

2015 ◽  
Author(s):  
Frank Torregrosa ◽  
Yohann Spiegel ◽  
Julien Duchaine ◽  
Thomas Michel ◽  
Gael Borvon ◽  
...  
Keyword(s):  
Recent Developments

Formation of Ge pn-junction diode by phosphorus doping with liquid immersion laser irradiation

2015 ◽  
Author(s):  
Kouta Takahashi ◽  
Masashi Kurosawa ◽  
Hiroshi Ikenoue ◽  
Mitsuo Sakashita ◽  
Wakana Takeuchi ◽  
...  
Keyword(s):  
Laser Irradiation ◽  
Phosphorus Doping ◽  
Pn Junction ◽  
Liquid Immersion ◽  
Junction Diode

Investigation of resistivity dependent microwave annealing on Si substrates

2015 ◽  
Author(s):  
Peng Xu ◽  
Chaochao Fu ◽  
Yan Wang ◽  
Ruixue Zeng ◽  
Jianfeng Pan ◽  
...  
Keyword(s):  
Si Substrates ◽  
Microwave Annealing
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