scholarly journals Nanoindentation Study of Amorphous Metal Multilayered Thin Films

1999 ◽  
Vol 594 ◽  
Author(s):  
J. B. Vella ◽  
R. C. Cammarata ◽  
T. P. Weihs ◽  
C. L. Chien ◽  
A. B. Mann ◽  
...  

AbstractNanoindentation studies were preformed on amorphous metal, multilayered thin films containing alternating layers of Fe50Ti50 and Cu35Nb65 in order to investigate the mechanism for plastic deformation in metallic glass. Films with a total thickness of 1μm and bilayer repeat lengths ranging from 2 to 50 nm were magnetron sputter-deposited onto sapphire substrates. In contrast to many crystalline multilayered systems, where large hardness enhancements have been observed when the bilayer repeat length is reduced below about 10 nm, no significant hardness enhancement as a function of bilayer repeat length was observed in the Fe50Ti50/ Cu35Nb65 amorphous metal system. This result suggests that a dislocation–like mechanism for plastic deformation may not be appropriate for these amorphous metals.

2002 ◽  
Vol 92 (1) ◽  
pp. 310-319 ◽  
Author(s):  
David L. Young ◽  
Helio Moutinho ◽  
Yanfa Yan ◽  
Timothy J. Coutts

1982 ◽  
Vol 21 (Part 1, No. 10) ◽  
pp. 1427-1430 ◽  
Author(s):  
Keiichi Tanabe ◽  
Osamu Michikami

2018 ◽  
Vol 913 ◽  
pp. 853-861 ◽  
Author(s):  
Geng An ◽  
Jun Sun ◽  
Yuan Jun Sun ◽  
Wei Cheng Cao

Aiming to produce qualified molybdenum (Mo) target for sputter deposition, Mo targets were prepared by utilizing powder metallurgy method in this research. The influences of sintering modes, press working modes and total deformation on microstructure and properties of Mo target were studied. Furthermore, magnetron sputtering test was conducted in vacuum environment by using the prepared Mo targets to deposit Mo thin films of which the surface morphologies, electrical conductivities, and crystalline properties were analyzed. The results show that vacuum presintering followed by hydrogen sintering mode can greatly decrease the impurity contents of Mo slabs. It is favorable to obtain the Mo target with fine and uniform grains on size and distribution by using forging mode or forging cogging mode and more than 70% total deformation. With the increase of sputtering currents of Mo target, the grain size and the thickness of the Mo thin films significantly rise, while FWHM of diffraction peaks of grain orientation (110), surface roughness and electrical resistivity of thin films decrease accordingly.


2017 ◽  
Vol 56 (22) ◽  
pp. 6114 ◽  
Author(s):  
S. Maidul Haque ◽  
Rajnarayan De ◽  
S. Tripathi ◽  
C. Mukherjee ◽  
A. K. Yadav ◽  
...  

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