Roughness Characterization of Si(110) Etched in TMAH by Atomic Force Microscopy

1999 ◽  
Vol 605 ◽  
Author(s):  
Z. Moktadir ◽  
K. Sato ◽  
A. Matsumuro ◽  
K. Kayukawa ◽  
M. Shikida

AbstractWe have investigated the roughness of a silicon (110)-oriented surface after being etched with 20% TMAH (Tetra-methyl Ammonium Hydroxide). We have used an Atomic Force Microscope to determine the roughness exponent α using three different methods: fractal, power spectrum density and scaling analysis. The value of the parameter α was identified to be close to 1/2. This value is different from the KPZ value, which is 0.4 in 2+1 dimension

1994 ◽  
Vol 367 ◽  
Author(s):  
T. Yoshinobu ◽  
A. Iwamoto ◽  
K. Sudoh ◽  
H. Iwasaki

AbstractThe scaling behavior of the surface roughness of a-and poly-Si deposited on Si was investigated by atomic force microscopy (AFM). The interface width W(L), defined as the rms roughness as a function of the linear size of the surface area, was calculated from various sizes of AFM images. W(L) increased as a power of L with the roughness exponent ∝ on shorter length scales, and saturated at a constant value of on a macroscopic scale. The value of roughness exponent a was 0.48 and 0.90 for a-and poly-Si, respectively, and σ was 1.5 and 13.6nm for 350nm-thick a-Si and 500nm-thick poly-Si, respectively. The AFM images were compared with the surfaces generated by simulation.


2003 ◽  
Vol 02 (04n05) ◽  
pp. 343-348 ◽  
Author(s):  
CHIH-HAO LEE ◽  
WEN-YEN PEN ◽  
MING-ZHE LIN ◽  
KUAN-LI YU ◽  
JEN-CHUNG HSUEH

Atomic force microscopy and X-ray reflectivity methods are used to characterize a surface morphology which includes the information of rms roughness, roughness exponent, and the height–height correlation length. Two major reasons to interpret the discrepancy of rms roughness data measured by AFM and X-ray reflectivity are (1) the bandpass of power spectra density is different and (2) the X-ray reflectivity probes the high density buried layer.


Author(s):  
Willian Silva Conceição ◽  
Ştefan Ţălu ◽  
Robert Saraiva Matos ◽  
Glenda Quaresma Ramos ◽  
Fidel Guereiro Zayas ◽  
...  

Micron ◽  
2011 ◽  
Vol 42 (3) ◽  
pp. 299-304 ◽  
Author(s):  
Gi-Ja Lee ◽  
Su-Jin Chae ◽  
Jae Hoon Jeong ◽  
So-Ra Lee ◽  
Sang-Jin Ha ◽  
...  

1994 ◽  
Vol 76 (6) ◽  
pp. 3443-3447 ◽  
Author(s):  
J. M. Yáñez‐Limón ◽  
F. Ruiz ◽  
J. González‐Hernández ◽  
C. Vázquez‐López ◽  
E. López‐Cruz

2005 ◽  
Vol 77 (2) ◽  
pp. 424-434 ◽  
Author(s):  
Phillip S. Dobson ◽  
John M. R. Weaver ◽  
Mark N. Holder ◽  
Patrick R. Unwin ◽  
Julie V. Macpherson

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