Microstructure Characterization of Amorphous Silicon Based Alloys by Inert Gas Effusion Studies
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ABSTRACTIt is shown that inert gas effusion employing implanted neon and argon atoms is a useful tool for microstructure characterization of a-Si based alloys. The method measures sensitively interconnected voids and gives information about sizes of microstructure. Limitations of the method are discussed. The results show network reconstruction effects in a-Si:O:H and a-Si:C:H alloys as a function of annealing.
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2014 ◽
Vol 11
(11-12)
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pp. 1711-1713
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