Strong Enhancement of Porous Silicon Photoluminescence by Dry Photo-Chemical Surface Treatment

2000 ◽  
Vol 638 ◽  
Author(s):  
S. Stolyarova ◽  
A. El-Bahar ◽  
Y. Nemirovsky

AbstractPorous silicon has been subjected to NF3/UV photochemical surface treatment in the range of 300-4000C. This treatment is found to enhance strongly the photoluminescence of porous silicon by couple orders of magnitude. The effect of photoluminescence enhancement has been observed only when the NF3 treated porous silicon was exposed to air environment. The photoluminescence intensity continued to grow with the aging time in air, even at the room temperature. Using atomic force microscope, scanning electron microscope and Auger measurements, it is found that the photoluminescence enhancement correlated with the formation of crystalline oxide layer at the porous silicon surface. This oxide layer SiOx (x≅2) is much more stoichiometric as compared to the native oxide SiOx (x≅1) covering the reference porous silicon surface (not treated by NF3). The rapid growth of the SiO2 layer is supposed to be due to the NF3/UV photo-thermal etching of the as-formed native oxide as well as to the cleaning and passivation of the porous silicon surface with fluorine.

2020 ◽  
Vol 12 (3) ◽  
pp. 03024-1-03024-4
Author(s):  
L. V. Poperenko ◽  
◽  
S. G. Rozouvan ◽  
I. V. Yurgelevych ◽  
P. O. Lishchuk ◽  
...  

1996 ◽  
Vol 431 ◽  
Author(s):  
D. R. Tallant ◽  
M. J. Kelly ◽  
T. R. Guilinger ◽  
R. L. Simpson

AbstractWe performed in-situ photoluminescence and Raman measurements on an anodized silicon surface in the HF/ethanol solution used for anodization. The porous silicon thereby produced, while resident in HF/ethanol, does not immediately exhibit intense photoluminescence. Intense photoluminescence develops spontaneously in HF/ethanol after 18–24 hours or with replacement of the HF/ethanol with water. These results support a quantum confinement mechanism in which exciton migration to traps and nonradiative recombination dominates the de-excitation pathways until silicon nanocrystals are physically separated and energetically decoupled by hydrofluoric acid etching or surface oxidation. The porous silicon surface, as produced by anodization, shows large differences in photoluminescence intensity and peak wavelength over millimeter distances. Parallel Raman measurements implicate nanometer-size silicon particles in the photoluminescence mechanism.


1994 ◽  
Vol 358 ◽  
Author(s):  
Eric J. Lee ◽  
James S. Ha ◽  
Michael J. Sailor

ABSTRACTThe porous silicon (PS) surface is derivatized with ethanol, triethylsilanol and formic acid as well as oxidized with water. The two reactions used to prepare these surfaces are discussed, and FTIR spectra of the products are presented. Surface-modified PS retains 10-40% of its original photoluminescence. PS-derivatives display reversible luminescence quenching by gas phase water, ethanol, acetonitrile and benzene. The extent of quenching varies with different PS-derivatives depending on the interaction of the chemical vapor with the modified PS surfaces.


1995 ◽  
Vol 66 (7) ◽  
pp. 836-838 ◽  
Author(s):  
Patrick O’Keeffe ◽  
Yoshinobu Aoyagi ◽  
Shuji Komuro ◽  
Takashi Kato ◽  
Takitaro Morikawa

CrystEngComm ◽  
2018 ◽  
Vol 20 (44) ◽  
pp. 7170-7177 ◽  
Author(s):  
Christian Ehlers ◽  
Stefan Kayser ◽  
David Uebel ◽  
Roman Bansen ◽  
Toni Markurt ◽  
...  

An in situ method for selectively heating a substrate by a laser pulse was modelled and investigated experimentally.


2017 ◽  
Vol 421 ◽  
pp. 82-88 ◽  
Author(s):  
F-Z. Tighilt ◽  
S. Belhousse ◽  
S. Sam ◽  
K. Hamdani ◽  
K. Lasmi ◽  
...  

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