photoluminescence enhancement
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2022 ◽  
Author(s):  
Kashyap Dave ◽  
Wen-Tse Huang ◽  
Tadeusz Leśniewski ◽  
Agata Lazarowska ◽  
Dawid Jankowski ◽  
...  

Here, we are reporting a halide precursors acid precipitation method to synthesize Cs2AgIn1–xBixCl6 (x = 0, 0.02, 0.04, 0.08, 0.16, 0.32, 0.64, and 1) microcrystals. Cs2AgInCl6 and Bi derivative double...


AIP Advances ◽  
2021 ◽  
Vol 11 (11) ◽  
pp. 115008
Author(s):  
Tao Chen ◽  
Ruliang Liu ◽  
Shumin Tang ◽  
Xiaonan Li ◽  
Shuming Ye ◽  
...  

2021 ◽  
Vol 12 (1) ◽  
Author(s):  
Zhaojun Li ◽  
Hope Bretscher ◽  
Yunwei Zhang ◽  
Géraud Delport ◽  
James Xiao ◽  
...  

AbstractThere is a growing interest in obtaining high quality monolayer transition metal disulfides for optoelectronic applications. Surface treatments using a range of chemicals have proven effective to improve the photoluminescence yield of these materials. However, the underlying mechanism for the photoluminescence enhancement is not clear, which prevents a rational design of passivation strategies. Here, a simple and effective approach to significantly enhance the photoluminescence is demonstrated by using a family of cation donors, which we show to be much more effective than commonly used p-dopants. We develop a detailed mechanistic picture for the action of these cation donors and demonstrate that one of them, bis(trifluoromethane)sulfonimide lithium salt (Li-TFSI), enhances the photoluminescence of both MoS2 and WS2 to a level double that of the currently best performing super-acid trifluoromethanesulfonimide (H-TFSI) treatment. In addition, the ionic salts used in our treatments are compatible with greener solvents and are easier to handle than super-acids, providing the possibility of performing treatments during device fabrication. This work sets up rational selection rules for ionic chemicals to passivate transition metal disulfides and increases their potential in practical optoelectronic applications.


2021 ◽  
Vol 130 (14) ◽  
pp. 145101
Author(s):  
R. A. Parker ◽  
N. Dontschuk ◽  
S.-I. Sato ◽  
C. T.-K. Lew ◽  
P. Reineck ◽  
...  

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