Low-Temperature Polycrystalline-Silicon Thin-Film Transistors Fabricated by Continuous-Wave Laser Lateral Crystallization and Metal/Hafnium Oxide Gate Stack on Nonalkaline Glass Substrate

2017 ◽  
Vol E100.C (1) ◽  
pp. 94-100 ◽  
Author(s):  
Tatsuya MEGURO ◽  
Akito HARA
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