Low-Temperature Polycrystalline-Silicon Thin-Film Transistors Fabricated by Continuous-Wave Laser Lateral Crystallization and Metal/Hafnium Oxide Gate Stack on Nonalkaline Glass Substrate
2017 ◽
Vol E100.C
(1)
◽
pp. 94-100
◽
2002 ◽
Vol 41
(Part 2, No. 3B)
◽
pp. L311-L313
◽
2012 ◽
Vol 51
(2S)
◽
pp. 02BJ03
◽
2004 ◽
Vol 43
(4A)
◽
pp. 1269-1276
◽
2006 ◽
Vol 45
(No. 36)
◽
pp. L973-L976
◽
2012 ◽
Vol 51
(2)
◽
pp. 02BJ03
◽
2011 ◽
Vol 50
(4)
◽
pp. 04DH10
◽
2011 ◽
Vol 50
(4S)
◽
pp. 04DH10
◽