Selective Growth of Self-Assembling Si and SiGe Quantum Dots

2014 ◽  
Vol E97.C (5) ◽  
pp. 393-396
Author(s):  
Katsunori MAKIHARA ◽  
Mitsuhisa IKEDA ◽  
Seiichi MIYAZAKI
1997 ◽  
Vol 482 ◽  
Author(s):  
H. Hirayama ◽  
S. Tanaka ◽  
P. Ramvall ◽  
Y. Aoyagi

AbstractWe demonstrate photoluminescence from self- assembling InGaN quantum dots (QDs), which are artificially fabricated on AlGaN surfaces via metal- organic chemical vapor deposition. InGaN QDs are successfully fabricated by the growth mode transition from step- flow to three dimensional island formation by using anti-surfactant silicon on AlGaN surface. The diameter and height of the fabricated InGaN QDs are estimated to be ˜10nm and ˜5nm, respectively, by an atomic- force- microscope (AFM). Indium mole fraction of InxGal−x N QDs is controlled from x=˜0.22 to ˜0.52 by varying the growth temperature of QDs. Intense photoluminescence is observed even at room temperature from InGaN QDs embedded with the GaN capping layers. In addition, the temperature- dependent energy shift of the photoluminescence peak- energy shows a localization behavior.


1998 ◽  
Vol 72 (14) ◽  
pp. 1736-1738 ◽  
Author(s):  
Hideki Hirayama ◽  
Satoru Tanaka ◽  
Peter Ramvall ◽  
Yoshinobu Aoyagi
Keyword(s):  

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pp. 164-174 ◽  
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K. Eberl ◽  
M.O. Lipinski ◽  
Y.M. Manz ◽  
W. Winter ◽  
N.Y. Jin-Phillipp ◽  
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P Changmuang ◽  
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pp. 726-730 ◽  
Author(s):  
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2001 ◽  
Vol 78 (10) ◽  
pp. 1403-1405 ◽  
Author(s):  
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C. M. Park ◽  
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M. H. Son ◽  
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2003 ◽  
Vol 101 (1-3) ◽  
pp. 199-203 ◽  
Author(s):  
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D. Débarre ◽  
V. Yam ◽  
D. Bouchier

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