Improvement of N-Type Crystalline Silicon Solar Cell Performance Using Novel Texturization Method.

Abstract Texturization of diamond cut crystalline silicon wafers undergoes a great difficulty due to deep saw marks on all over the surface of the wafer which makes hindrance to manufacture high efficiency solar cell. Textural result is not satisfactory after conventional texturization by potassium hydroxide (KOH)-isopropyl alcohol (IPA) followed by the saw damage removal by sodium hydroxide (NaOH) aqueous solution. The non-uniform texture surface has been observed with noticeable spots on the wafer surface. Surface texturization of diamond cut silicon wafer has been improved after introducing a new method in this paper. Small amount of surfactant along with KOH-IPA solution and curtailing saw damage removal step created better textural result than conventional texturization method. Optimize etching solution exhibited excellent anisotropic etching which eventually paved to improve solar cell characteristics than conventional surface texturing. About 15% efficiency is found for conventional texturization in diamond cut wafers while above 19% efficiency was found for our proposed method. Batch process compatibility has been studied using stainless steel container instead of commercially available borosil glass bath.

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Surface Texturing for Crystalline Silicon Solar Cell Using RIE Equipped with Metal-Mesh

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.328-330.747 ◽

2011 ◽

Vol 328-330 ◽

pp. 747-750 ◽

Cited By ~ 1

Author(s):

Dae Young Kong ◽

Chan Seob Cho ◽

Jun Hwan Jo ◽

Bong Hwan Kim ◽

Jong Hyun Lee

Keyword(s):

Solar Cell ◽

Silicon Wafer ◽

Crystalline Silicon ◽

Low Cost ◽

Surface Texturing ◽

Wafer Surface ◽

Process Time ◽

Black Silicon ◽

Crystalline Silicon Solar Cell ◽

Metal Mesh

Surface texturing is an important process to enhance light absorption and to improve efficiency of a solar cell. Reactive ion etching (RIE) process is a very effective process and low-cost process, which is applicable during the dry etching processes for thin crystalline silicon solar cells with large areas. In this study, we studied a dry and free mask texturing process on crystalline silicon wafer using SF6/O2plasmas and metal mesh in a RIE system, with special attention to the effect of the metal mesh and RIE conditions on the texture of the silicon surface. In particular, we have found an optimized RIE conditions by increasing the distance between the metal mesh and silicon wafer. We have also found that by increasing the RIE process time, with an optimized SF6/O2ratio, pressure and RF power, it is possible to switch from a random texture, to a nm-size pyramid texture and finally to an um-size pyramid texture. This RIE system textured a crystalline wafer surface that formed about 1~2 μm pyramidal black silicon with 7~10% of reflectivity.

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Influence of surface texturing conditions on crystalline silicon solar cell performance

Current Applied Physics ◽

10.1016/j.cap.2013.01.008 ◽

2013 ◽

Vol 13 ◽

pp. S34-S40 ◽

Cited By ~ 9

Author(s):

Hyunho Kim ◽

Sungeun Park ◽

Soo Min Kim ◽

Seongtak Kim ◽

Young Do Kim ◽

...

Keyword(s):

Solar Cell ◽

Silicon Solar Cell ◽

Crystalline Silicon ◽

Surface Texturing ◽

Cell Performance ◽

Crystalline Silicon Solar Cell ◽

Solar Cell Performance

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Effect of surface texturing processes on the performance of crystalline silicon solar cell

Solar Energy ◽

10.1016/j.solener.2016.12.010 ◽

2017 ◽

Vol 147 ◽

pp. 228-231 ◽

Cited By ~ 13

Author(s):

Khaldun A. Salman

Keyword(s):

Solar Cell ◽

Silicon Solar Cell ◽

Crystalline Silicon ◽

Surface Texturing ◽

Crystalline Silicon Solar Cell ◽

Effect Of Surface

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Effect of Plasmonic Nanoparticles on the Electric Field Strength to Improve Performance of Single Crystalline Solar Cell

Al-Nahrain Journal for Engineering Sciences ◽

10.29194/njes.22040315 ◽

2019 ◽

Vol 22 (4) ◽

pp. 315-322

Author(s):

Samah Mohammed Al-Karawi ◽

Mohammed Fawzi Mohammed Altemimi

Keyword(s):

Solar Cell ◽

Field Strength ◽

Electric Field ◽

Electric Field Strength ◽

Crystalline Silicon ◽

Separation Distance ◽

Crystalline Silicon Solar Cell ◽

Solar Cell Performance ◽

Single Crystalline ◽

Gold Nps

The effect of metal nanoparticles (MNPs) on the electric field strength and distribution for improvement solar cell performance is investigated and simulated. By manipulating the properties of nanoparticles, distribution of the electric field was altered. In this paper, classical solar cell (p-n junction) and improved structure (add an extra layer of SiO2 and gold nanoparticles on the top of p-n junction) is simulated. Different sizes of NPs, thickness of SiO2 sublayer, and spacing distance between NPs is done to improving the electric field and showing plamonic effect. Gold NPs deposition on single crystalline silicon solar cell is modelled by COMSOL 5.2 2D, Electromagnetic wave propagation in the frequency domain with periodic boundary conditions. The best wavelength found in our work is 550 nm. The electric field enhances when the size of NPs increases but it must be limited. When gold NPs are deposited on the SiO2 sublayer, the plasmonic effect appears due to decreasing the refractive index. Moreover, separation distance between NPs affect the electric field enhancement by manipulating the number of NPs, the distance decreases and the plasmonic interaction appears.

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