scholarly journals Investigation of the production of cobalt-60 via particle accelerator

2017 ◽  
Vol 32 (4) ◽  
pp. 327-333 ◽  
Author(s):  
Ozan Artun
Keyword(s):  
Charged Particle ◽  
Production Process ◽  
Irradiation Time ◽  
Target Material ◽  
Particle Beam ◽  
Beam Current ◽  
Particle Accelerator ◽  
Optimum Energy ◽  
Integral Yield ◽  
Reaction Processes

The production process of cobalt-60 was simulated by a particle accelerator in the energy range of 5 to 100 MeV, particle beam current of 1 mA, and irradiation time of 1 hour to perform yield, activity of reaction, and integral yield for charged particle-induced reactions. Based on nuclear reaction processes, the obtained results in the production process of cobalt-60 were also discussed in detail to determine appropriate target material, optimum energy ranges, and suitable reactions.

Investigation of production of samarium-151 and europium-152,154,155 via particle accelerator

2019 ◽  
Vol 34 (20) ◽  
pp. 1950154 ◽  
Author(s):  
Ozan Artun
Keyword(s):  
Irradiation Time ◽  
Particle Beam ◽  
Beam Current ◽  
Alpha Particles ◽  
Particle Accelerator ◽  
Integral Yield ◽  
Battery Technology ◽  
Reaction Processes ◽  
Nuclear Battery

This work aimed to investigate the production of [Formula: see text]Sm and [Formula: see text]Eu on natural Nd and Sm targets via particle accelerator because these radionuclides have the potential for use in nuclear battery technology such as betavoltaic batteries and radioisotope thermoelectric generators. Therefore, this work estimated cross-section curves for proton, deuteron, triton, helium-3, and alpha particles induced reactions in the energy range [Formula: see text]. The activities and products of yield were simulated for all reaction processes under selected conditions, the particle beam current of 1 mA and the irradiation time of 24 h. Moreover, to understand the formations of [Formula: see text] and [Formula: see text]Eu in the reaction processes, the appropriate energy region of the reactions by calculating the integral yield curves were determined. Based on the obtained results, determination of suitable targets, energy regions, and reaction processes were discussed by this work.

scholarly journals A 128-channel picoammeter system and its application on charged particle beam current distribution measurements

2015 ◽  
Vol 86 (11) ◽  
pp. 115102 ◽  
Author(s):  
Deyang Yu ◽  
Junliang Liu ◽  
Yingli Xue ◽  
Mingwu Zhang ◽  
Xiaohong Cai ◽  
...  
Keyword(s):  
Charged Particle ◽  
Current Distribution ◽  
Particle Beam ◽  
Beam Current ◽  
Charged Particle Beam

scholarly journals Charged particle single nanometre manufacturing

2018 ◽  
Vol 9 ◽  
pp. 2855-2882 ◽  
Author(s):  
Philip D Prewett ◽  
Cornelis W Hagen ◽  
Claudia Lenk ◽  
Steve Lenk ◽  
Marcus Kaestner ◽  
...  
Keyword(s):  
Charged Particle ◽  
High Throughput ◽  
Nanoimprint Lithography ◽  
Ion Beam ◽  
Ambient Air ◽  
Particle Beam ◽  
Vacuum System ◽  
Scanning Tunneling ◽  
Tunneling Microscopy ◽  
Charged Particle Beam

Following a brief historical summary of the way in which electron beam lithography developed out of the scanning electron microscope, three state-of-the-art charged-particle beam nanopatterning technologies are considered. All three have been the subject of a recently completed European Union Project entitled “Single Nanometre Manufacturing: Beyond CMOS”. Scanning helium ion beam lithography has the advantages of virtually zero proximity effect, nanoscale patterning capability and high sensitivity in combination with a novel fullerene resist based on the sub-nanometre C60 molecule. The shot noise-limited minimum linewidth achieved to date is 6 nm. The second technology, focused electron induced processing (FEBIP), uses a nozzle-dispensed precursor gas either to etch or to deposit patterns on the nanometre scale without the need for resist. The process has potential for high throughput enhancement using multiple electron beams and a system employing up to 196 beams is under development based on a commercial SEM platform. Among its potential applications is the manufacture of templates for nanoimprint lithography, NIL. This is also a target application for the third and final charged particle technology, viz. field emission electron scanning probe lithography, FE-eSPL. This has been developed out of scanning tunneling microscopy using lower-energy electrons (tens of electronvolts rather than the tens of kiloelectronvolts of the other techniques). It has the considerable advantage of being employed without the need for a vacuum system, in ambient air and is capable of sub-10 nm patterning using either developable resists or a self-developing mode applicable for many polymeric resists, which is preferred. Like FEBIP it is potentially capable of massive parallelization for applications requiring high throughput.

Robustness of Time-Resolved Measurement to Unknown and Variable Beam Current in Particle Beam Microscopy

2021 ◽  
Author(s):  
Luisa Watkins ◽  
Sheila W. Seidel ◽  
Minxu Peng ◽  
Akshay Agarwal ◽  
Christopher C. Yu ◽  
...  
Keyword(s):  
Particle Beam ◽  
Beam Current ◽  
Time Resolved
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