scholarly journals Pd/GaN(0001) interface properties

2014 ◽  
Vol 32 (2) ◽  
pp. 252-256 ◽  
Author(s):  
M. Grodzicki ◽  
P. Mazur ◽  
S. Zuber ◽  
J. Pers ◽  
A. Ciszewski

AbstractThis report concerns the properties of an interface formed between Pd films deposited onto the surface of (0001)-oriented n-type GaN at room temperature (RT) under ultrahigh vacuum. The surface of clean substrate and the stages of Pd-film growth were characterized in situ by X-ray photoelectron spectroscopy (XPS), scanning tunneling microscopy (STM), ultraviolet photoelectron spectroscopy (UPS), and low energy electron diffraction (LEED).As-deposited Pd films are grainy, cover the substrate surface uniformly and reproduce its topography. Electron affinity of the clean n-GaN surface amounts to 3.1 eV. The work function of the Pd-film is equal to 5.3 eV. No chemical interaction has been found at the Pd/GaN interface formed at RT. The Schottky barrier height of the Pd/GaN contact is equal to 1.60 eV.

1992 ◽  
Vol 263 ◽  
Author(s):  
O. Lang ◽  
R. Schlaf ◽  
Y. Tomm ◽  
C. Pettenkofer ◽  
W. Jaegermann

ABSTRACTGaSe layers were grown on the van der Waals (0001) planes of WSe2 (van der Waals epitaxy). The substrate (0001) plane was cleaned in UHV by heating to 400°C. GaSe was deposited from resistively heated Knudsen cells at T=300° C. After annealing at 450°C an epitaxial GaSe overlayer is formed as evidenced by X-ray diffraction, scanning tunneling microscopy, low energy electron diffraction and photoelectron spectroscopy.


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