scholarly journals Optimizing the Atomic Layer Deposition of Alumina on Perovskite Nanocrystal Films by Using O2 as a Molecular Probe

2019 ◽  
Author(s):  
Seryio Saris ◽  
Sanduni Dona ◽  
Valerie Niemann ◽  
Anna Loiudice ◽  
Raffaella Buonsanti
Keyword(s):  
Atomic Layer Deposition ◽  
Molecular Diffusion ◽  
Protective Layer ◽  
Atomic Layer ◽  
Molecular Probe ◽  
Alumina Layer ◽  
Layer Deposition ◽  
Metal Halide Perovskite ◽  
Improved Stability ◽  
Nanocrystal Films

Encapsulation methods have been shown to be effective in imparting improved stability to metal-halide perovskite nanocrystals. Here, we optimize the atomic layer deposition of amorphous alumina as a protective layer for CsPbBr3 quantum dot thin films. We use oxygen as a molecular diffusion probe to assess the uniformity of the deposited alumina layer.

scholarly journals Optimizing the Atomic Layer Deposition of Alumina on Perovskite Nanocrystal Films by Using O2 as a Molecular Probe

2019 ◽  
Author(s):  
Seryio Saris ◽  
Sanduni Dona ◽  
Valerie Niemann ◽  
Anna Loiudice ◽  
Raffaella Buonsanti
Keyword(s):  
Atomic Layer Deposition ◽  
Molecular Diffusion ◽  
Protective Layer ◽  
Atomic Layer ◽  
Molecular Probe ◽  
Alumina Layer ◽  
Layer Deposition ◽  
Metal Halide Perovskite ◽  
Improved Stability ◽  
Nanocrystal Films

Encapsulation methods have been shown to be effective in imparting improved stability to metal-halide perovskite nanocrystals. Here, we optimize the atomic layer deposition of amorphous alumina as a protective layer for CsPbBr3 quantum dot thin films. We use oxygen as a molecular diffusion probe to assess the uniformity of the deposited alumina layer.

Optimizing the Atomic Layer Deposition of Alumina on Perovskite Nanocrystal Films by Using O 2 As a Molecular Probe

2020 ◽  
Vol 103 (6) ◽  
Author(s):  
Seryio Saris ◽  
Sanduni T. Dona ◽  
Valerie Niemann ◽  
Anna Loiudice ◽  
Raffaella Buonsanti
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Molecular Probe ◽  
Layer Deposition ◽  
Nanocrystal Films

Atomic Layer Deposition of a Nanometer-Thick Li3PO4 Protective Layer on LiNi0.5Mn1.5O4 Films: Dream or Reality for Long-Term Cycling?

2021 ◽  
Vol 13 (13) ◽  
pp. 15761-15773
Author(s):  
Maxime Hallot ◽  
Borja Caja-Munoz ◽  
Clement Leviel ◽  
Oleg I. Lebedev ◽  
Richard Retoux ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Protective Layer ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Atomic layer deposition for efficient oxygen evolution reaction at Pt/Ir catalyst layers

2020 ◽  
Vol 11 ◽  
pp. 952-959
Author(s):  
Stefanie Schlicht ◽  
Korcan Percin ◽  
Stefanie Kriescher ◽  
André Hofer ◽  
Claudia Weidlich ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Noble Metal ◽  
Bimetallic Catalyst ◽  
Precursor Solution ◽  
Atomic Layer ◽  
Dip Coating ◽  
Experimental Conditions ◽  
Catalyst Layers ◽  
Layer Deposition ◽  
Improved Stability

We provide a direct comparison of two distinct methods of Ti felt surface treatment and Pt/Ir electrocatalyst deposition for the positive electrode of regenerative fuel cells and vanadium–air redox flow batteries. Each method is well documented in the literature, and this paper provides a direct comparison under identical experimental conditions of electrochemical measurements and in identical units. In the first method, based on classical engineering, the bimetallic catalyst is deposited by dip-coating in a precursor solution of the salts followed by their thermal decomposition. In the alternative method, more academic in nature, atomic layer deposition (ALD) is applied to the felts after anodization. ALD allows for a controlled coating with ultralow noble-metal loadings in narrow pores. In acidic electrolyte, the ALD approach yields improved mass activity (557 A·g−1 as compared to 80 A·g−1 at 0.39 V overpotential) on the basis of the noble-metal loading, as well as improved stability.

Atomic Layer Deposition for Improved Stability of Catalysts for the Conversion of Biomass to Chemicals and Fuels

2011 ◽  
Vol 1366 ◽  
Author(s):  
Monika K. Wiedmann ◽  
Yomaira J. Pagan-Torres ◽  
Mark H. Tucker ◽  
James A. Dumesic ◽  
T. F. Kuech
Keyword(s):  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Rate Constant ◽  
Flow Reactor ◽  
Atomic Layer ◽  
Deactivation Rate ◽  
Layer Deposition ◽  
Improved Stability ◽  
Deactivation Rate Constant ◽  
Acid Catalyzed

ABSTRACTAtomic layer deposition (ALD) has been used to coat SBA-15 and functionalized SBA-15 with various metal oxides. Use of SBA-15 coated with 4-10 ALD cycles of titania, alumina, niobia, or zirconia in the acid-catalyzed dehydration of fructose to 5-hydroxymethylfurfural (HMF) resulted in 24-57% conversion, with 0-22% selectivity, at 130 °C with 2 wt % fructose in 4:1 THF:H2O. Propylsulfonic acid functionalized SBA-15 (SBA-15-PrSO3H) had a 25% conversion and 48% selectivity for HMF under the same conditions. SBA-15-PrSO3H was also coated with 2 ALD cycles of titania followed by 8 ALD cycles silica. The deactivation rate constant for SBA-15-PrSO3H was 2.7 x 10-2 h-1 for the dehydration of fructose to HMF in a flow reactor at 130 °C with a feed of 2 wt % fructose in 4:1 THF:H2O. In comparison, the deactivation rate constant for the ALD coated SBA-15-PrSO3H-ALD was 7.9 x 10-3 h-1.

scholarly journals Improved Stability of Polymer Solar Cells in Ambient Air via Atomic Layer Deposition of Ultrathin Dielectric Layers

2017 ◽  
Vol 4 (18) ◽  
pp. 1700231 ◽  
Author(s):  
Ermioni Polydorou ◽  
Martha A. Botzakaki ◽  
Ilias Sakellis ◽  
Anastasia Soultati ◽  
Andreas Kaltzoglou ◽  
...  
Keyword(s):  
Solar Cells ◽  
Atomic Layer Deposition ◽  
Polymer Solar Cells ◽  
Atomic Layer ◽  
Ambient Air ◽  
Dielectric Layers ◽  
Layer Deposition ◽  
Improved Stability

scholarly journals Selective Growth of Al2O3 on Size-Selected Platinum Clusters by Atomic Layer Deposition

2019 ◽  
Author(s):  
Timothy J. Gorey ◽  
Yang Dai ◽  
Scott Anderson ◽  
Sungsik Lee ◽  
Sungwon Lee ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Photoelectron Spectroscopy ◽  
High Vacuum ◽  
Atomic Layer ◽  
Ultra High Vacuum ◽  
Ex Situ ◽  
Dimensional Structure ◽  
Alumina Layer ◽  
X Ray ◽  
Layer Deposition

In heterogeneous catalysis, atomic layer deposition (ALD) has been developed as a tool to stabilize and reduce carbon deposition on supported nanoparticles. Here, we discuss use of high vacuum ALD to deposit alumina films on size-selected, sub-nanometer Pt/SiO2 model catalysts. Mass-selected Pt24 clusters were deposited on oxidized Si(100), to form model Pt24/SiO2 catalysts with particles shown to be just under 1 nm, with multilayer three dimensional structure. Alternating exposures to trimethylaluminum and water vapor in an ultra-high vacuum chamber were used to grow alumina on the samples without exposing them to air. The samples were probed in situ using X-ray photoelectron spectroscopy (XPS), low-energy ion scattering spectroscopy (ISS), and CO temperature-programmed desorption (TPD). Additional samples were prepared for ex situ experiments using grazing incidence small angle x-ray scattering spectroscopy (GISAXS). Alumina growth is found to initiate at least 60 times more efficiently at the Pt24 cluster sites, compared to bare SiO2/Si, with a single ALD cycle depositing a full alumina layer on top of the clusters, with substantial additional alumina growth initiating on SiO2 sites surrounding the clusters. As a result, the clusters were completely passivated, with no exposed Pt binding sites.

Sign in / Sign up

Export Citation Format

Share Document