Osteoblast Adhesion on Cathodic Arc Plasma Deposited Nano-Multilayered TiCrAlSiN Thin Films

Korean Journal of Metals and Materials ◽

10.3365/kjmm.2014.52.3.243 ◽

2014 ◽

Vol 52 (3) ◽

pp. 243-248

Author(s):

Sun Kyu Kim ◽

Vuong Hung Pham

Keyword(s):

Osteoblast Adhesion ◽

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Cathodic arc plasma deposition of nano-multilayered ZrN/AlSiN thin films

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2011.09.042 ◽

2011 ◽

Vol 206 (6) ◽

pp. 1507-1510 ◽

Author(s):

Sun Kyu Kim ◽

Vinh Van Le

Keyword(s):

Plasma Deposition ◽

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The Cathodic Arc Plasma Deposition of Thin Films

Thin Film Processes ◽

10.1016/b978-0-08-052421-4.50010-1 ◽

1991 ◽

pp. 209-280 ◽

Author(s):

PHILIP C. JOHNSON

Keyword(s):

Plasma Deposition ◽

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Mechanical property evaluation of cathodic arc plasma-deposited CrN thin films on Fe–Mn–Al–C alloys

Surface and Coatings Technology ◽

10.1016/s0257-8972(03)00222-6 ◽

2003 ◽

Vol 168 (2-3) ◽

pp. 223-230 ◽

Author(s):

Jyh-Wei Lee ◽

Jenq-Gong Duh ◽

Jyh-Hwa Wang

Keyword(s):

Mechanical Property ◽

Property Evaluation ◽

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Deposition of superhard TiAlSiN thin films by cathodic arc plasma deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2005.08.109 ◽

2005 ◽

Vol 200 (5-6) ◽

pp. 1391-1394 ◽

Author(s):

S.K. Kim ◽

P.V. Vinh ◽

J.H. Kim ◽

T. Ngoc

Keyword(s):

Plasma Deposition ◽

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Oxidation of TiAlCrSiN Thin Films at 1000°C in Air

Applied Mechanics and Materials ◽

10.4028/www.scientific.net/amm.719-720.127 ◽

2015 ◽

Vol 719-720 ◽

pp. 127-131

Author(s):

Min Jung Kim ◽

Dong Bok Lee

Keyword(s):

Oxide Scale ◽

Oxidation Resistance ◽

Plasma Deposition ◽

TiAlCrSiN thin films consisting of alternating TiCrN and AlSiN nanolayers were deposited by cathodic arc plasma deposition, and oxidized at 1000°C in air. When oxidized for 10 h, about 1 μm-thick oxide sale formed, and its surface was covered with numerous tiny oxide crystallites. When oxidized for 30 h, about 2.5 μm-thick oxide scale formed, and began to spall from the surface. When oxidized for 80 h, the oxide sale was about 12.2 μm-thick. The film had a reasonable oxidation resistance due mainly to Al, Cr, and Si, which formed protective oxides.

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Deposition of superhard nanolayered TiCrAlSiN thin films by cathodic arc plasma deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2008.06.020 ◽

2008 ◽

Vol 202 (22-23) ◽

pp. 5395-5399 ◽

Author(s):

Sun Kyu Kim ◽

Pham Van Vinh ◽

Jae Wook Lee

Keyword(s):

Plasma Deposition ◽

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Development of New Hydrogen-containing Tetrahydral Amorphous Carbon Thin Films using Cathodic Arc Plasma for Dental Implant

Journal of Photopolymer Science and Technology ◽

10.2494/photopolymer.28.471 ◽

2015 ◽

Vol 28 (3) ◽

pp. 471-474 ◽

Author(s):

Tatsuyuki Nakatani ◽

Koutarou Shiraishi ◽

Shinsuke Kunitsugu

Keyword(s):

Dental Implant ◽

Amorphous Carbon ◽

Carbon Thin Films ◽

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Cathodic arc plasma deposited TiAlSiN thin films using an Al-15at.% Si cathode

Thin Solid Films ◽

10.1016/j.tsf.2010.05.029 ◽

2010 ◽

Vol 518 (24) ◽

pp. 7483-7486 ◽

Author(s):

Sun Kyu Kim ◽

Vinh Van Le

Keyword(s):

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High-rate and low-temperature growth of ZnO:Ga thin films by steered cathodic arc plasma evaporation

Applied Surface Science ◽

10.1016/j.apsusc.2012.11.062 ◽

2013 ◽

Vol 265 ◽

pp. 621-629 ◽

Author(s):

Chih-Hao Liang ◽

Wei-Lin Wang ◽

Weng-Sing Hwang

Keyword(s):

Low Temperature ◽

High Rate ◽

Temperature Growth ◽

Low Temperature Growth ◽

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Cell adhesion to cathodic arc plasma deposited CrAlSiN thin films

Applied Surface Science ◽

10.1016/j.apsusc.2012.04.036 ◽

2012 ◽

Vol 258 (18) ◽

pp. 7202-7206 ◽

Author(s):

Sun Kyu Kim ◽

Vuong-Hung Pham ◽

Chong-Hyun Kim

Keyword(s):

Cell Adhesion ◽

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