scholarly journals Copper Hexacyanoferrate Thin Film Deposition and Its Application to a New Method for Diffusion Coefficient Measurement

Nanomaterials ◽  
2021 ◽  
Vol 11 (7) ◽  
pp. 1860
Author(s):  
Jeonghun Yun ◽  
Yeongae Kim ◽  
Caitian Gao ◽  
Moobum Kim ◽  
Jae Yoon Lee ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Electrochemical Characteristics ◽  
Deposition Method ◽  
Copper Hexacyanoferrate ◽  
Spontaneous Deposition ◽  
Copper Thin Film ◽  
Coefficient Measurement ◽  
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The use of Prussian blue analogues (PBA) materials in electrochemical energy storage and harvesting has gained much interest, necessitating the further clarification of their electrochemical characteristics. However, there is no well-defined technique for manufacturing PBA-based microelectrochemical devices because the PBA film deposition method has not been well studied. In this study, we developed the following deposition method for growing copper hexacyanoferrate (CuHCFe) thin film: copper thin film is immersed into a potassium hexacyanoferrate solution, following which the redox reaction induces the spontaneous deposition of CuHCFe thin film on the copper thin film. The film grown via this method showed compatibility with conventional photolithography processes, and the micropattern of the CuHCFe thin film was successfully defined by a lift-off process. A microelectrochemical device based on the CuHCFe thin film was fabricated via micropatterning, and the sodium ion diffusivity in CuHCFe was measured. The presented thin film deposition method can deposit PBAs on any surface, including insulating substrates, and it can extend the utilization of PBA thin films to various applications.

CVD copper thin film deposition using (α-methylstyrene)Cu(I)(hfac)

2001 ◽  
Vol 11 (PR3) ◽  
pp. Pr3-553-Pr3-560 ◽  
Author(s):  
W. Zhuang ◽  
L. J. Charneski ◽  
D. R. Evans ◽  
S. T. Hsu ◽  
Z. Tang ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Copper Thin Film

scholarly journals Nanoimprinted multifunctional nanoprobes for a homogeneous immunoassay in a top-down fabrication approach

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Hubert Brueckl ◽  
Astrit Shoshi ◽  
Stefan Schrittwieser ◽  
Barbara Schmid ◽  
Pia Schneeweiss ◽  
...  
Keyword(s):  
Thin Film ◽  
Nanoimprint Lithography ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
In Vitro Diagnostics ◽  
Top Down ◽  
Highly Sensitive ◽  
Optical And Magnetic Properties ◽  
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AbstractMultifunctional nanoparticles are discussed as versatile probes for homogeneous immunoassays for in-vitro diagnostics. Top-down fabrication allows to combine and tailor magnetic and plasmonic anisotropic properties. The combination of nanoimprint lithography, thin film deposition, and lift-off processing provides a top-down fabrication platform, which is both flexible and reliable. Here, we discuss the material compositions and geometrical designs of monodisperse multicomponent nanoparticles and their consequences on optical and magnetic properties. The rotational hydrodynamics of nanoparticles is measured and considered under the influence of magnetic shape anisotropy in the framework of the Stoner-Wohlfarth theory. The plasmon-optical properties are explained by discrete-dipole finite-element simulations. Rotational dynamical measurements of imprinted nanoprobes for two test proteins demonstrate the applicability as highly sensitive biomolecular nanoprobes.

Novel thin-film deposition method and system with IR-FEL

2000 ◽  
Author(s):  
Masato Yasumoto ◽  
Norimasa Umesaki ◽  
Takio Tomimasu ◽  
Akira Ishizu ◽  
Kunio Awazu
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Deposition Method

Thin film synthesis of SbSI micro-crystals for self-powered photodetectors with rapid time response

Nanoscale ◽  
2016 ◽  
Vol 8 (35) ◽  
pp. 15920-15925 ◽  
Author(s):  
Karl C. Gödel ◽  
Ullrich Steiner
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Time Response ◽  
Deposition Method ◽  
Self Powered ◽  
Film Synthesis

We describe a new thin film deposition method for the growth of crystalline SbSI micro-needles via the conversion of Sb2S3 using SbI3 vapour, in a facile process that takes less than 15 minutes.

scholarly journals Self-Aligned Thin-Film Patterning by Area-Selective Etching of Polymers

Coatings ◽  
2021 ◽  
Vol 11 (9) ◽  
pp. 1124
Author(s):  
Chao Zhang ◽  
Markku Leskelä ◽  
Mikko Ritala
Keyword(s):  
Thin Film ◽  
Polymer Film ◽  
Semiconductor Devices ◽  
Atomic Layer ◽  
Thin Film Deposition ◽  
Selective Etching ◽  
Film Deposition ◽  
Deposition Processes ◽  
Lift Off ◽  
Thin Film Patterning

Patterning of thin films with lithography techniques for making semiconductor devices has been facing increasing difficulties with feature sizes shrinking to the sub-10 nm range, and alternatives have been actively sought from area-selective thin film deposition processes. Here, an entirely new method is introduced to self-aligned thin-film patterning: area-selective gas-phase etching of polymers. The etching reactions are selective to the materials underneath the polymers. Either O2 or H2 can be used as an etchant gas. After diffusing through the polymer film to the catalytic surfaces, the etchant gas molecules are dissociated into their respective atoms, which then readily react with the polymer, etching it away. On noncatalytic surfaces, the polymer film remains. For example, polyimide and poly(methyl methacrylate) (PMMA) were selectively oxidatively removed at 300 °C from Pt and Ru, while on SiO2 they stayed. CeO2 also showed a clear catalytic effect for the oxidative removal of PMMA. In H2, the most active surfaces catalysing the hydrogenolysis of PMMA were Cu and Ti. The area-selective etching of polyimide from Pt was followed by area-selective atomic layer deposition of iridium using the patterned polymer as a growth-inhibiting layer on SiO2, eventually resulting in dual side-by-side self-aligned formation of metal-on-metal and insulator (polymer)-on-insulator. This demonstrates that when innovatively combined with area-selective thin film deposition and, for example, lift-off patterning processes, self-aligned etching processes will open entirely new possibilities for the fabrication of the most advanced and challenging semiconductor devices.

scholarly journals Micropits MEMS

2019 ◽  
Vol 6 (12) ◽  
Author(s):  
José Luis González-Vidal
Keyword(s):  
Thin Film ◽  
Gas Sensors ◽  
Etching Rate ◽  
Thin Film Deposition ◽  
Consumer Products ◽  
Film Deposition ◽  
Scanning Electronic Microscopy ◽  
Si Substrate ◽  
Mems Fabrication ◽  
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Three sized Micropits were developed. Micropits were designed and fabricated using wet etching. MEMS fabrication consists of thin film deposition and patterned of several geometric structures. For Si substrate etching three layers SiO2/ Si3N4/ SiO2 were deposited and patterned. They were used as a mask. Micropit pattern was transferred by lift off technique. SiO2, Si3N4 layers and Si substrate were etched by HF, H3PO4 and KOH solutions. Si substrate has 7mm/h etching rate. Micropit micrographs were obtained by scanning electronic microscopy (SEM). Micropits are MEMS widely used in gas sensors, because they provide thermal isolation, Micropits will be used for gas microsensors, polisilicon microheater and gas sensor thin film will be deposited later. Today gas sensors have several applications in manufacturing & industry, such as, automotive, medicine/biomedical, consumer products, aerospace, chemical, optical displays, fluidics, wireless and optical communications.

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