Optimal phase shift mask and multilayer stack with the evaluation of imaging performance and process latitude in extreme ultraviolet high numerical aperture

2021 ◽  
Vol 60 (SC) ◽  
pp. SCCA04
Author(s):  
In-Hwa Kang ◽  
Jang-Gun Park ◽  
Chung-Hyun Ban ◽  
Hye-Keun Oh
Keyword(s):  
Phase Shift ◽  
Extreme Ultraviolet ◽  
Numerical Aperture ◽  
High Numerical Aperture ◽  
Imaging Performance ◽  
Phase Shift Mask

Optimal phase shift and reflectance for high numerical aperture EUV phase shift mask

2021 ◽  
Author(s):  
Inhwa Kang ◽  
Jang-Gun Park ◽  
Minwoo Kim ◽  
Jun-Hyeong Lee ◽  
Hye-Keun Oh
Keyword(s):  
Phase Shift ◽  
Numerical Aperture ◽  
High Numerical Aperture ◽  
Phase Shift Mask

Effect of Attenuated Phase Shift Mask Structure on Extreme Ultraviolet Lithography

2009 ◽  
Vol 48 (6) ◽  
pp. 06FA06 ◽  
Author(s):  
Hyun-Duck Shin ◽  
Chang Young Jeoung ◽  
Tae Geun Kim ◽  
Sangsul Lee ◽  
In-Sung Park ◽  
...  
Keyword(s):  
Phase Shift ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Phase Shift Mask
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