Chemical Mechanical Polishing of Glass Substrate with α-Alumina-g-Polystyrene Sulfonic Acid Composite Abrasive

2010 ◽  
Vol 23 (03) ◽  
pp. 276 ◽  
Author(s):  
Hong LEI
Keyword(s):  
Chemical Mechanical Polishing ◽  
Glass Substrate ◽  
Sulfonic Acid ◽  
Mechanical Polishing ◽  
Polystyrene Sulfonic Acid

Chemical mechanical polishing of hard disk substrate with α-alumina-g-polystyrene sulfonic acid composite abrasive

2010 ◽  
Vol 518 (14) ◽  
pp. 3792-3796 ◽  
Author(s):  
Hong Lei ◽  
Naijing Bu ◽  
Ruling Chen ◽  
Ping Hao ◽  
Sima Neng ◽  
...  
Keyword(s):  
Chemical Mechanical Polishing ◽  
Sulfonic Acid ◽  
Hard Disk ◽  
Mechanical Polishing ◽  
Polystyrene Sulfonic Acid ◽  
Hard Disk Substrate ◽  
Disk Substrate

Direct-Write Polymer Diodes

2002 ◽  
Vol 734 ◽  
Author(s):  
Mikhail I. Sluch ◽  
Robert L. Parkhill ◽  
Robert M. Taylor ◽  
Kenneth H. Church
Keyword(s):  
Glass Substrate ◽  
Conjugated Polymer ◽  
Sulfonic Acid ◽  
Schottky Diodes ◽  
Direct Write ◽  
Rectifier Circuit ◽  
Full Wave ◽  
Bridge Rectifier ◽  
Type Semiconductor ◽  
Polystyrene Sulfonic Acid

ABSTRACTConjugated polymer Schottky diodes have been directly written onto glass and alumina substrates. The rectifying contact was made between the p-type semiconductor poly(3,4-ethylene-dioxythiophene) doped with polystyrene sulfonic acid and Zn. The devices exhibit rectification ratios in the range of 102:1 to 103:1 at biases of ±1 V and ±10 V, respectively. The devices demonstrate rectification at frequencies up to 250 kHz. A full-wave bridge rectifier circuit written onto a glass substrate converts ac to dc up to 250 kHz and ±5 V.

Nanoporous polystyrene sulfonic acid blended membranes

2020 ◽  
Author(s):  
Adam Bruce Ung ◽  
G. K. Surya Prakash ◽  
Thieo E. Hogen-Esch
Keyword(s):  
Sulfonic Acid ◽  
Polystyrene Sulfonic Acid
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