Electrical conductive hard-carbon (diamond-like carbon) films formed by i-C4H10/N2 supermagnetron plasma chemical vapor deposition method

Thin Solid Films ◽

10.1016/s0040-6090(00)01091-9 ◽

2000 ◽

Vol 373 (1-2) ◽

pp. 251-254 ◽

Author(s):

Haruhisa Kinoshita ◽

Jun Takahashi ◽

Takuya Hando

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Deposition Method ◽

Hard Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Preparation of Polymer Particles Coated with a Diamond-like Carbon Film by a Polygonal Barrel-Plasma Chemical Vapor Deposition Method

ECS Meeting Abstracts ◽

10.1149/ma2012-02/39/2937 ◽

2012 ◽

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Carbon Film ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Deposition Method ◽

Polymer Particles ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Diamond-like carbon films deposited on polyethylene terephthalate substrates by radio frequency plasma chemical vapor deposition method

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1537717 ◽

2003 ◽

Vol 21 (2) ◽

pp. 515-517 ◽

Author(s):

Ayako Kimura ◽

Hideyuki Kodama ◽

Tetsuya Suzuki

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Chemical Vapor Deposition Method ◽

Diamond Like Carbon ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Frequency Plasma

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Intrinsic Amorphous Silicon (a-Si:H) Thin Film Prepared by Using Remote Plasma Chemical Vapor Deposition Method and Used as a Passivation Layer for a Heterojunction Solar Cell

Journal of the Korean Physical Society ◽

10.3938/jkps.54.194 ◽

2009 ◽

Vol 54 (1) ◽

pp. 194-199 ◽

Author(s):

Minsung Jeon ◽

Shuhei Yoshiba ◽

Koichi Kamisako

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Electron emission from diamond thin films deposited by microwave plasma-chemical vapor deposition method

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00325-3 ◽

2000 ◽

Vol 9 (9-10) ◽

pp. 1604-1607 ◽

Author(s):

Changzhi Gu ◽

Zengsun Jin ◽

Yuguang Wang ◽

Wencheng Jin ◽

Hong Ji ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electron Emission ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Synthesis of Diamond-Like Carbon Films Using Hot Filament-Aided Microwave Plasma Chemical Vapor Deposition

Plasma Science and Technology ◽

10.1088/1009-0630/3/6/005 ◽

2001 ◽

Vol 3 (6) ◽

pp. 1043-1048

Author(s):

Huang Wei-dong ◽

Wu Cong-feng ◽

Zhan Ru-juan

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Carbon Films ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

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Structure and Mechanical Properties of Diamond-Like Carbon Films Prepared from C2H2and H2Mixtures by Pulse Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.49.075501 ◽

2010 ◽

Vol 49 (7) ◽

pp. 075501 ◽

Author(s):

Shinji Fujimoto ◽

Hiroki Akasaka ◽

Tsuneo Suzuki ◽

Naoto Ohtake ◽

Osamu Takai

Keyword(s):

Mechanical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Pulse Plasma ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Synthesis of Diamond-like Carbon Films by Nanopulse Plasma Chemical Vapor Deposition in Open Air

Journal of the Japan Society for Precision Engineering Contributed Papers ◽

10.2493/jspe.72.1237 ◽

2006 ◽

Vol 72 (10) ◽

pp. 1237-1241

Author(s):

Yoshimasa KONDO ◽

Takao SAITO ◽

Masanori SAITO ◽

Tatsuya TERAZAWA ◽

Naoto OHTAKE

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Diamond Like Carbon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Preparation of (Tl, Pb)-Sr-Ca-Cu-O Superconducting Thin Films by the Mist Microwave-Plasma Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.l840 ◽

1994 ◽

Vol 33 (Part 2, No. 6B) ◽

pp. L840-L842 ◽

Author(s):

Naoyuki Takahashi ◽

Akinori Koukitu ◽

Hisashi Seki ◽

Yasuharu Kamioka

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Preparation of (Bi, Pb)-Sr-Ca-Cu-O Superconducting Thin Films by the Mist Microwave-Plasma Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.l1648 ◽

1993 ◽

Vol 32 (Part 2, No. 11B) ◽

pp. L1648-L1650 ◽

Author(s):

Naoyuki Takahashi ◽

Daigorou Kanematsu ◽

Akinori Koukitu ◽

Hisashi Seki ◽

Yasuharu Kamioka

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Novel plasma chemical vapor deposition method of carbon nanotubes at low temperature for field emission display application

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00475-1 ◽

2001 ◽

Vol 10 (2) ◽

pp. 248-253 ◽

Author(s):

Suk Jae Chung ◽

Sung Hoon Lim ◽

Choong Hun Lee ◽

Jin Jang

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Field Emission Display ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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