Silicon Based Light Emitters for On-Chip Optical Interconnects

Author(s):  
Martin Kittler ◽  
T. Arguirov ◽  
Winfried Seifert ◽  
X. Yu ◽  
M. Reiche
2002 ◽  
Author(s):  
Amitabh Chatterjee ◽  
Bharat L. Bhuva ◽  
William C. Cieslik

Author(s):  
Gregory Briggs ◽  
Hui Chen ◽  
Nicholas Nelson ◽  
David Albonesi ◽  
Philippe Fauchet ◽  
...  

Nanomaterials ◽  
2019 ◽  
Vol 9 (2) ◽  
pp. 157 ◽  
Author(s):  
Yin Xu ◽  
Feng Li ◽  
Zhe Kang ◽  
Dongmei Huang ◽  
Xianting Zhang ◽  
...  

Polarization-insensitive modulation, i.e., overcoming the limit of conventional modulators operating under only a single-polarization state, is desirable for high-capacity on-chip optical interconnects. Here, we propose a hybrid graphene-silicon-based polarization-insensitive electro-absorption modulator (EAM) with high-modulation efficiency and ultra-broad bandwidth. The hybrid graphene-silicon waveguide is formed by leveraging multi-deposited and multi-transferred methods to enable light interaction with graphene layers in its intense field distribution region instead of the commonly used weak cladding region, thus resulting in enhanced light–graphene interaction. By optimizing the dimensions of all hybrid graphene-silicon waveguide layers, polarization-insensitive modulation is achieved with a modulation efficiency (ME) of ~1.11 dB/µm for both polarizations (ME discrepancy < 0.006 dB/µm), which outperforms that of previous reports. Based on this excellent modulation performance, we designed a hybrid graphene-silicon-based EAM with a length of only 20 µm. The modulation depth (MD) and insertion loss obtained were higher than 22 dB and lower than 0.23 dB at 1.55 µm, respectively, for both polarizations. Meanwhile, its allowable bandwidth can exceed 300 nm by keeping MD more than 20 dB and MD discrepancy less than 2 dB, simultaneously, and its electrical properties were also analyzed. Therefore, the proposed device can be applied in on-chip optical interconnects.


Nanophotonics ◽  
2014 ◽  
Vol 3 (4-5) ◽  
pp. 283-311 ◽  
Author(s):  
Daoxin Dai ◽  
John E. Bowers

AbstractAn effective solution to enhance the capacity of an optical-interconnect link is utilizing advanced multiplexing technologies, like wavelength-division-multiplexing (WDM), polarization-division multiplexing (PDM), spatial-division multiplexing (SDM), bi-directional multiplexing, etc. On-chip (de)multiplexers are necessary as key components for realizing these multiplexing systems and they are desired to have small footprints due to the limited physical space for on-chip optical interconnects. As silicon photonics has provided a very attractive platform to build ultrasmall photonic integrated devices with CMOS-compatible processes, in this paper we focus on the discussion of silicon-based (de)multiplexers, including WDM filters, PDM devices, and SDM devices. The demand of devices to realize a hybrid multiplexing technology (combining WDM, PDM and SDM) as well as a bidirectional multiplexing technologies are also discussed to achieve Peta-bit optical interconnects.


2005 ◽  
Vol 108-109 ◽  
pp. 749-754 ◽  
Author(s):  
Martin Kittler ◽  
Tzanimir Arguirov ◽  
Winfried Seifert ◽  
X. Yu ◽  
Manfred Reiche

Electroluminescence of B and P implanted samples has been studied. P implantation is found to have a similar effect on light emission as B implant. The band-to-band (BB) luminescence of P implanted diodes is observed to increase by more than one order of magnitude upon rising the temperature and an internal efficiency of 2 % has been reached at 300 K. An efficiency larger than 5% seems to be reachable. The strong BB line emission at 1.1 &m is attributed to high bulk SRH lifetime. The BB line escapes from the substrate below the p-n junction. It is not due to the implantation-related defects/dislocations. The luminescence spectrum can be tailored to achieve dominance of the dislocation-related D1 line at about 1.5 &m. It is observed that a regular periodic dislocation network, formed by Si wafer direct bonding with a specific misorientation, exhibits even at 300 K only D1 photoluminescence. Such a dislocation network is believed to be a serious candidate to gain an efficient Si-based light emitter.


Nanophotonics ◽  
2019 ◽  
Vol 9 (8) ◽  
pp. 2377-2385 ◽  
Author(s):  
Zhao Cheng ◽  
Xiaolong Zhu ◽  
Michael Galili ◽  
Lars Hagedorn Frandsen ◽  
Hao Hu ◽  
...  

AbstractGraphene has been widely used in silicon-based optical modulators for its ultra-broadband light absorption and ultrafast optoelectronic response. By incorporating graphene and slow-light silicon photonic crystal waveguide (PhCW), here we propose and experimentally demonstrate a unique double-layer graphene electro-absorption modulator in telecommunication applications. The modulator exhibits a modulation depth of 0.5 dB/μm with a bandwidth of 13.6 GHz, while graphene coverage length is only 1.2 μm in simulations. We also fabricated the graphene modulator on silicon platform, and the device achieved a modulation bandwidth at 12 GHz. The proposed graphene-PhCW modulator may have potentials in the applications of on-chip interconnections.


Sign in / Sign up

Export Citation Format

Share Document