Solvent-Assisted Self-Assembly of ZnO Nanoparticles on Mica and its Characterization

2010 ◽  
Vol 152-153 ◽  
pp. 1830-1834
Author(s):  
Hua Lan Zhou ◽  
Zhong Zou ◽  
Sha Wu ◽  
Wen Jian Shi
Keyword(s):  
Atomic Force Microscopy ◽  
Zno Nanoparticles ◽  
Photoelectron Spectroscopy ◽  
Self Assembly ◽  
Advanced Materials ◽  
Zno Nanostructures ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Solvent Density

Ordered nanostructure arrangement directly from solution onto surface is one of the important methods to synthesis advanced materials. In this paper, solvent-assisted self-assembly of ZnO nanoparticles on mica was investigated. Results showed ZnO nanoparticles were closely linked to each other and formed fork-like nanostructures on mica. ZnO nanostructures were characterized by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). The possible mechanism of nanoparticle self-assembly was given. The decrease of solvent density led to the aggregation of nanoparticles. It may provide a simple and effective method to construct nanostructures.

Ultrathin Ruthenium(II) Complex–H4SiW12O40 Multilayer Film

2008 ◽  
Vol 8 (3) ◽  
pp. 1248-1253 ◽  
Author(s):  
Yu-Qi Zhang ◽  
Li-Hua Gao ◽  
Ke-Zhi Wang ◽  
Hong-Jun Gao ◽  
Ye-Liang Wang
Keyword(s):  
Atomic Force Microscopy ◽  
Cyclic Voltammetry ◽  
Photoelectron Spectroscopy ◽  
Self Assembly ◽  
Multilayer Film ◽  
Multilayer Films ◽  
Layer By Layer ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force

A dipolar Ru(II) complex, [(bpy)2Ru(bpbh)Ru(bpy)2](ClO4)4 {where bpbh = 1,6-bis-[2-(2-pyridyl) benzimidazoyl]hexane, bpy = 2,2′-bipyridine}, was synthesized and characterized. A multilayer film of at least 18 layers was successfully prepared by alternating adsorption of H4SiW12O40 and [Ru2(bpy)4(bpbh)](ClO4)4 by electrostatic layer-by-layer self-assembly. The multilayer films were studied by ultraviolet-visible and X-ray photoelectron spectroscopy, atomic force microscopy, and cyclic voltammetry.

Investigation of Ti/CuO interface by X-ray photoelectron spectroscopy and atomic force microscopy

2018 ◽  
Vol 51 (2) ◽  
pp. 246-253
Author(s):  
Dev Raj Chopra ◽  
Justin Seth Pearson ◽  
Darius Durant ◽  
Ritesh Bhakta ◽  
Anil R. Chourasia
Keyword(s):  
Atomic Force Microscopy ◽  
Photoelectron Spectroscopy ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force

Characterization of X-ray irradiated graphene oxide coatings using X-ray diffraction, X-ray photoelectron spectroscopy, and atomic force microscopy

2013 ◽  
Vol 28 (2) ◽  
pp. 68-71 ◽  
Author(s):  
Thomas N. Blanton ◽  
Debasis Majumdar
Keyword(s):  
Atomic Force Microscopy ◽  
Graphene Oxide ◽  
Photoelectron Spectroscopy ◽  
High Energy ◽  
X Ray Diffraction ◽  
Carbon Phase ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Before And After

In an effort to study an alternative approach to make graphene from graphene oxide (GO), exposure of GO to high-energy X-ray radiation has been performed. X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM) have been used to characterize GO before and after irradiation. Results indicate that GO exposed to high-energy radiation is converted to an amorphous carbon phase that is conductive.

Surface segregation of boron in BxGa1−xAs/GaAs epilayers studied by x-ray photoelectron spectroscopy and atomic force microscopy

2003 ◽  
Vol 82 (12) ◽  
pp. 1830-1832 ◽  
Author(s):  
H. Dumont ◽  
D. Rutzinger ◽  
C. Vincent ◽  
J. Dazord ◽  
Y. Monteil ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Photoelectron Spectroscopy ◽  
Surface Segregation ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force
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