Structural and Optical Properties of VO2 Film Grown on Sapphire Substrate by Pulsed Laser Deposition

VO2films were grown on sapphire substrates by pulsed laser deposition (PLD), and the structural and optical properties of as-grown films were investigated by X-ray diffraction (XRD), field effect scanning electron microscopy (FESEM), photoluminescence (PL), and optical-transmission measurements. The oxygen partial pressure in the growth chamber was found to be the key factor deciding the microstructure and properties of as-deposited VO2films, and its effects and corresponding mechanism were investigated systemically. Results indicated that dense and uniform VO2films with smooth surface were achieved by PLD under optimized oxygen partial pressure. Strong blue emission peaks were observed in room temperature photoluminescence (PL) spectra. Excellent selective optical-transmission of the VO2thin films from 200~3000 nm were also recorded at room temperature.

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Effect of oxygen partial pressure on microstructural and optical properties of titanium oxide thin films prepared by pulsed laser deposition

Materials Research Bulletin ◽

10.1016/j.materresbull.2013.07.009 ◽

2013 ◽

Vol 48 (11) ◽

pp. 4901-4906 ◽

Cited By ~ 13

Author(s):

G. Balakrishnan ◽

Vengala Rao Bandi ◽

S.M. Rajeswari ◽

N. Balamurugan ◽

R. Venkatesh Babu ◽

...

Keyword(s):

Thin Films ◽

Optical Properties ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Pulsed Laser Deposition ◽

Titanium Oxide ◽

Pulsed Laser ◽

Laser Deposition ◽

Oxide Thin Films ◽

Effect Of Oxygen

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Electrical, structural, and optical properties of ITO thin films prepared at room temperature by pulsed laser deposition

Applied Surface Science ◽

10.1016/j.apsusc.2005.07.134 ◽

2006 ◽

Vol 252 (13) ◽

pp. 4834-4837 ◽

Cited By ~ 78

Author(s):

Jong Hoon Kim ◽

Kyung Ah Jeon ◽

Gun Hee Kim ◽

Sang Yeol Lee

Keyword(s):

Thin Films ◽

Optical Properties ◽

Pulsed Laser Deposition ◽

Room Temperature ◽

Pulsed Laser ◽

Laser Deposition ◽

Structural And Optical Properties ◽

Ito Thin Films

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Room Temperature Ferromagnetism in Ti0.985Co0.015O2-δ Thin Films Grown by Pulsed Laser Deposition Technique

Materials Science Forum ◽

10.4028/www.scientific.net/msf.760.1 ◽

2013 ◽

Vol 760 ◽

pp. 1-7 ◽

Cited By ~ 2

Author(s):

P. Mohanty ◽

V. Ganeshan ◽

Chandana Rath

Keyword(s):

Thin Films ◽

Oxygen Partial Pressure ◽

Partial Pressure ◽

Pulsed Laser Deposition ◽

Room Temperature ◽

Room Temperature Ferromagnetism ◽

Pulsed Laser ◽

Phase Changes ◽

Laser Deposition ◽

Partial Pressures

Ti0.985Co0.015O2-δ thin films are deposited at 0, 0.1, 1 and 300 mTorr oxygen partial pressures by pulsed laser deposition (PLD) technique. Glancing angle x- ray diffraction (GAXRD) and micro-Raman spectroscopy show that the phase changes from rutile to anatase with increasing oxygen partial pressure. From Rutherford backscattering spectroscopic (RBS) technique, O to (Ti+Co) atomic ratio is found to increase with increasing oxygen partial pressure. Further, the simulation of RBS data while reveals non-uniform distribution of Co throughout the film deposited at 0 and 0.1 mTorr oxygen partial pressures, at 1 and 300 mTorr oxygen partial pressure, Co distribution is found to be uniform. Magnetic measurements confirm the room temperature ferromagnetism (RTFM) in all the films independent of the phase. Magnetic force microscopy (MFM) further supports the ferromagnetic nature of the films. We attribute the ferromagnetism in the films to be arisen from defects like oxygen vacancies rather than any contamination or Co clustering.

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