Low Energy Ar+ Ions Scattering from SiO2 (001)<Ῑ10> Surface under Grazing Incidence

2022 ◽  
Vol 1049 ◽  
pp. 152-157
Author(s):  
Atabek S. Ashirov ◽  
Uchkun O. Kutliev ◽  
Soyibjon Xakimov ◽  
Shavkat K. Ismailov

This article presents the results of computer modeling of small-angle scattering of Ar+ ions from the surface of the SiO2 thin film under bombardment by low-energy. The study of the trajectory of the scattered ions showed that the trajectories with two focuses are observed not only near the center of the semichannel but also nearby the surface of the atomic chain. An increase in the value of the initial energy of incident particles leads to a narrowing of the trajectory of the scattered ions, which leads to the appearance of low-intensity peaks in the energy spectrum of the scattered ions.

2007 ◽  
Vol 32 (1) ◽  
pp. 275-280
Author(s):  
Hiroshi Okuda ◽  
Shojiro Ochiai ◽  
M. Ohtaka ◽  
Tetsu Ichitubo ◽  
Ei-ichiro Matsubara, ◽  
...  

Author(s):  
Wei Zhang ◽  
Ian K. Robinson

We recently proposed a new grazing exit geometry for measuring the small-angle scattering from thin film materials, which we call GESAXS, to contrast with the successful grazing incidence version, GISAXS. The technique is particularly useful for probing nanostructured thin film materials, especially when the coherence properties of the beam are employed. Here we demonstrate the application of GESAXS to evaporated metal films, prepared using an in-situ diffraction chamber, to investigate how their structure evolves upon annealing. Contrasting behavior is seen for Au, which preserves a roughly exponential distribution of domain sizes, and Fe for which the size distribution narrows by an Ostwald ripening process.


2002 ◽  
Vol 81 (13) ◽  
pp. 2358-2360 ◽  
Author(s):  
Hiroshi Okuda ◽  
Shojiro Ochiai ◽  
Kazuki Ito ◽  
Yoshiyuki Amemiya

1997 ◽  
Vol 30 (5) ◽  
pp. 822-827 ◽  
Author(s):  
A. Naudon ◽  
D. Thiaudiere

It is shown that grazing-incidence small-angle X-ray scattering (GISAXS) is a new experimental technique that combines both grazing incidence and scattering at low angles. The experiments are carried out at or near the critical angle: the result is a considerably enhanced surface sensitivity. It allows morphological characterization of aggregates deposited or gathered on a flat substrate, such as silicon wafer or Coming glass. The full potential of this technique is realized when using a synchrotron source (flux, collimation and choice of wavelength in order to avoid fluorescence or to perform anomalous measurements) and when patterns are recorded with two-dimensional detectors: gas detectors or imaging plates (IPs). It is then possible to study the anisotropic shape of the scattering pattern and to determine the sizes of the aggregates. Results are presented for gold clusters deposited on a silicon wafer covered by a carbon sublayer in order to make a comparison with transmission electron microscopy and with scanning probe microscopy. Other examples are presented in order to highlight the advantages of such a technique applied to small inclusions in thin surface layers.


Langmuir ◽  
2009 ◽  
Vol 25 (16) ◽  
pp. 9500-9509 ◽  
Author(s):  
Darren R. Dunphy ◽  
Todd M. Alam ◽  
Michael P. Tate ◽  
Hugh W. Hillhouse ◽  
Bernd Smarsly ◽  
...  

1980 ◽  
Vol 170 (1-3) ◽  
pp. 509-512 ◽  
Author(s):  
I. Terzić ◽  
D. Ćirić ◽  
N. Nešković ◽  
V.S. Chernysh ◽  
B. Perović

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