Fabrication and Properties of Large-Area Silicon Nanowire Arrays
2009 ◽
Vol 610-613
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pp. 604-609
Keyword(s):
Wet chemical etching with dry metal deposition method has been developed to fabricate large-area aligned silicon nanowire (SiNW) arrays. The combination of nanoclusters Ag film with proper interconnection and interspaces (of about 20 nm thick), and proper temperature during etching (from 20 to 80 °C) is vital to successfully fabricating large-area uniform SiNW arrays. Raman and photoluminescence spectra of the SiNW arrays indicated their potential applications in chemical detection and optical devices ,respectively.
2016 ◽
Vol 19
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pp. 64-70
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Keyword(s):
2008 ◽
Vol 18
(16)
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pp. 2348-2355
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2011 ◽
Vol 194-196
◽
pp. 598-601
Keyword(s):
2002 ◽
Vol 14
(16)
◽
pp. 1164
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Keyword(s):
2014 ◽
Vol 2
(30)
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pp. 4894-4900
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Keyword(s):
2011 ◽
Vol 39
(7)
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pp. 994-997
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Keyword(s):
Keyword(s):
2010 ◽
Vol 663-665
◽
pp. 840-843
Keyword(s):