Cost-Effective Alternatives to Palladium Activation – A Study on Autocatalytic Electroless Copper Deposition

2010 ◽  
Vol 2010 (1) ◽  
pp. 000861-000866
Author(s):  
Edith Steinhäuser ◽  
T.A. Magaya

Electroless copper plating is the most important and critical step for through-hole metallization of printed circuit boards. Conventional electroless copper solutions contain formaldehyde as the standard reducing agent. Due to the toxic nature of formaldehyde, there is a need to change to a reducing agent that is more environmentally friendly and safer to use. Many reducing compounds have been proposed to replace formaldehyde. For example, glyoxylic acid has been described in the literature as an especially attractive alternative because of its relative safety. In preparation for electroless copper plating, substrates are typically catalyzed by the adsorption of palladium. However, a change in the reducing agent can also lead to a change in the activation process, primarily because there is no single metal that appears to be a good catalyst for the oxidation of all reducing agents that have been employed for electroless deposition. In the present study, electrochemical measurements were carried out in order to obtain information about the catalytic activity of copper, silver, nickel and palladium in the oxidation reaction of formaldehyde as well as glyoxylic acid. Metals with high catalytic activity for each reductant oxidation can be determined by using cyclic voltammetry. These metals are candidates for an improved activation process. Electrochemical measurements showed that palladium does not have the highest catalytic activity of all tested metals. Therefore, more cost-effective, alternative metals were examined as catalysts for electroless copper plating reactions. The paper presents the results of a PhD thesis, which included tests on cheaper alternatives to palladium for activation of autocatalytic electroless copper deposition. It also includes production scale studies and conclusions on possible replacement of formaldehyde as a reducing agent for electroless copper deposition.

2014 ◽  
Vol 609-610 ◽  
pp. 55-63 ◽  
Author(s):  
Hong Fang Ma ◽  
Fang Ma ◽  
Hua Sun ◽  
Xiaor Rui Wang ◽  
Rong Yan Jiang ◽  
...  

This paper reports a novel and facile activation process for electroless copper plating on Acrylonitrile Butadiene Styrene (ABS) plastic substrate using gold nanoparticles as catalyst. Gold nanoparticles were prepared by chemical reduction method and characterized by UVvisible adsorption spectrum and transmission electron microscope (TEM). The gold nanoparticles were sphere-like with a size of less than 50 nm. Gold nanoparticles were adsorbed on ABS surface and acted as nucleation centers in activating process of the electroless copper plating. The uniform and dense film was obtained at the optimal technological parameters which were achieved by the orthogonal experiment. The scanning electron microscope (SEM), energy dispersive spectrometer (EDS), X-ray diffractometer (XRD) and X-ray photoelectron spectroscopy (XPS) were used to detect the morphology, structure and elemental composition of the coating, respectively. The results indicated that copper coating contained only Cu (0) without any other elements.


2004 ◽  
Vol 49 (2) ◽  
pp. 233-238 ◽  
Author(s):  
Michinari Sone ◽  
Koichi Kobayakawa ◽  
Makoto Saitou ◽  
Yuichi Sato

1997 ◽  
Vol 95 (1) ◽  
pp. 34-37 ◽  
Author(s):  
D.H. Cheng ◽  
W.Y. Xu ◽  
Z.Y. Zhang ◽  
Z.H. Yiao

2007 ◽  
Vol 201 (16-17) ◽  
pp. 7018-7023 ◽  
Author(s):  
Xueping Gan ◽  
Yating Wu ◽  
Lei Liu ◽  
Bin Shen ◽  
Wenbin Hu

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