scholarly journals Electron Holography by Field Emission Electron Microscope

1980 ◽  
Vol 22 (3) ◽  
pp. 263-269 ◽  
Author(s):  
Akira TONOMURA ◽  
Tsuyoshi MATSUDA ◽  
Junji ENDO
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
Electron Holography ◽  
Emission Electron

Off-axis electron holography by field emission electron microscope

1978 ◽  
Vol 36 (1) ◽  
pp. 224-225
Author(s):  
A. Tonomura ◽  
T. Matsuda ◽  
T. Komoda
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
Electron Source ◽  
Electron Gun ◽  
Electron Holography ◽  
One Dimensional ◽  
Interference Fringes ◽  
Emission Electron ◽  
Electric Supply ◽  
Optical Laser

Although the feasibility of electron holography has been verified by several authors, it has not yet been put to practical use. This is because of the lack of a coherent electron source, such as optical laser. In practice, the number of interference fringes produced with a biprism is 200 at most, the exception being one dimensional cases. Off-axis holography requires 5,000∼100,000 interference fringes. Therefore, the useful application of electron holography in higher resolution and phase contrast electron microscopy hinges on development of a coherent electron source capable of producing 5,000 fringes or more.To realize a coherent electron source, a 100 kV field emission electron gun was developed and attached to an electron microscope. In designing the microscope,special care was taken in the column and electric supply. This was done to minimize movement of the small beam spot, which is easily disturbed from outside, so as to maintain the field emission electron beam.

The influence of the objective lens current in low magnification electron holography

1995 ◽  
Vol 53 ◽  
pp. 614-615
Author(s):  
B.G. Frost ◽  
D.C. Joy ◽  
E. Völkl ◽  
L.F. Allard
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Field Emission ◽  
Focal Plane ◽  
Reference Wave ◽  
Object Wave ◽  
Objective Lens ◽  
Electron Holography ◽  
Emission Electron

In order to align an electron microscope for low magnification holography we usually completely switch off the objective lens and image the sample by the first intermediate lens. In addition, to achieve a highly coherent electron beam we highly excite the condensor lens resulting in a divergent illumination of the sample and the intermediate lens. Now negatively biasing the fiber of a Möllenstedt type biprism placed between the first an second intermediate lenses of our Hitachi HF-2000 field emission electron microscope creates two virtual sources below the back focal plane of the first intermediate lens. These two sources are necessary to form off-axis holograms. Slightly exciting the objective lens and still imaging the sample by the first intermediate lens results in two major changes in our holograms.First: Due to an electron beam less divergent or even convergent illuminating the first intermediate lens when exciting the objective lens (compare Fig. 1 to Fig.2) the angle β at which object wave and reference wave are superimposed decreases.

Development of 350-KV holography electron microscope equipped with magnetic type field-emission electron gun

1989 ◽  
Vol 47 ◽  
pp. 104-105
Author(s):  
J. Endo ◽  
T. Kawasaki ◽  
T. Masuda ◽  
A. Tonomura
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
High Sensitivity ◽  
Beam Current ◽  
Electron Gun ◽  
Electron Holography ◽  
Electron Microscopic ◽  
Magnetic Lens ◽  
High Brightness ◽  
Emission Electron

A field-emission electron gun is one of the most epoch-making technologies in an electron microscopic world. In a transmission electron microscope, a high brightness of this beam has been effectively employed for electron-holographic measurements, though the value is not still high enough. Development of a higher brightness beam will promise to open up unattained application possibilities of electron holography such as high resolution and high sensitivity interferometry.We developed the field emission electron microscope for electron holographic applications. Special attentions were paid for high brightness, large beam current and easy operation. Figure 1 is a schematic diagram of the electron gun. In order not to deteriorate the original high-brightness feature of the beam by the aberrations in the gun and the condenser lenses, a magnetic lens was installed between the tip and the extraction anode so that the total aberration effect might be minimized. Field emitted electron beam is converged by the magnetic and the electrostatic lenses, and accelerated in a ten-stage accelerator which is made of porcelain.

Characteristics and Application of Temperature-Field Emitters

1975 ◽  
Vol 33 ◽  
pp. 144-145
Author(s):  
N. Tamura ◽  
T. Goto ◽  
Y. Harada
Keyword(s):  
Temperature Field ◽  
Electron Microscope ◽  
Field Emission ◽  
Resolving Power ◽  
High Brightness ◽  
Field Emitters ◽  
Emission Electron ◽  
Sufficient Stability ◽  
Scanning Electron ◽  
Illuminating System

On account of its high brightness, the field emission electron source has the advantage that it provides the conventional electron microscope with highly coherent illuminating system and that it directly improves the, resolving power of the scanning electron microscope. The present authors have reported some results obtained with a 100 kV field emission electron microscope.It has been proven, furthermore, that the tungsten emitter as a temperature field emission source can be utilized with a sufficient stability under a modest vacuum of 10-8 ~ 10-9 Torr. The present paper is concerned with an extension of our study on the characteristics of the temperature field emitters.

Atomic resolution AEM (ARAEM) of oxide superconductors

1992 ◽  
Vol 50 (1) ◽  
pp. 74-75
Author(s):  
Vinayak P. Dravid ◽  
H. Zhang ◽  
L.D. Marks ◽  
J.P. Zhang
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
Atomic Resolution ◽  
Oxide Superconductors ◽  
Electron Holography ◽  
Analytical Electron ◽  
Analytical Electron Microscope ◽  
Point To Point ◽  
Single Instrument ◽  
Better Than

A 200 kV cold field emission gun atomic resolution analytical electron microscope (ARAEM, Hitachi HF-2000) has been recently installed at Northwestern. The ARAEM offers an unprecedented combination of atomic structure imaging of better than 0.20 nm nominal point-to-point resolution and about 0.10 nm line resolution, alongwith nanoscale analytical capabilities and electron holography in one single instrument. The ARAEM has been fully functional/operational and this paper presents some illustrative examples of application of ARAEM techniques to oxide superconductors. Additional results will be presented at the meeting.

Electron holography of p-n junctions

1996 ◽  
Vol 54 ◽  
pp. 974-975
Author(s):  
B.G. Frost ◽  
D.C. Joy ◽  
L.F. Allard ◽  
E. Voelkl
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Field Emission ◽  
Ccd Camera ◽  
Image Plane ◽  
Reference Wave ◽  
Field Of View ◽  
Control Mode ◽  
Objective Lens ◽  
Electron Holography

A wide holographic field of view (up to 15 μm in the Hitachi-HF2000) is achieved in a TEM by switching off the objective lens and imaging the sample by the first intermediate lens. Fig.1 shows the corresponding ray diagram for low magnification image plane off-axis holography. A coherent electron beam modulated by the sample in its amplitude and its phase is superimposed on a plane reference wave by a negatively biased Möllenstedt-type biprism.Our holograms are acquired utilizing a Hitachi HF-2000 field emission electron microscope at 200 kV. Essential for holography are a field emission gun and an electron biprism. At low magnification, the excitation of each lens must be appropriately adjusted by the free lens control mode of the microscope. The holograms are acquired by a 1024 by 1024 slow-scan CCD-camera and processed by the “Holoworks” software. The hologram fringes indicate positively and negatively charged areas in a sample by the direction of the fringe bending (Fig.2).

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