Surface passivation of crystalline silicon by sputtered AlOx/AlNx stacks toward low-cost high-efficiency silicon solar cells

2015 ◽  
Vol 54 (8S1) ◽  
pp. 08KD18 ◽  
Author(s):  
Hyunju Lee ◽  
Keigo Ueda ◽  
Yuya Enomoto ◽  
Koji Arafune ◽  
Haruhiko Yoshida ◽  
...  
Author(s):  
Yutaka Hayashi ◽  
Tadashi Saitoh ◽  
Kunio Hane ◽  
Ryuichi Shimokawa ◽  
Toshihide Takeshita

2017 ◽  
Vol 56 (8S2) ◽  
pp. 08MB11 ◽  
Author(s):  
Woojun Yoon ◽  
James Moore ◽  
Anthony Lochtefeld ◽  
Nicole Kotulak ◽  
David Scheiman ◽  
...  

MRS Bulletin ◽  
1993 ◽  
Vol 18 (10) ◽  
pp. 33-37 ◽  
Author(s):  
Allen M. Barnett ◽  
Robert B. Hall ◽  
James A. Rand

Solar cells formed with thin silicon active layers (<100 μm thick) offer advantages over thick ingot-based devices. The advantages come in two forms: the first is the potential for higher conversion efficiency than that of conventional thick devices, and the second is a reduction in material requirements. The use of thin polycrystalline silicon for solar cells offers the potential of capturing the high performance of crystalline silicon while achieving the potential low cost of thin films. Experimental and theoretical studies initially uncovered the issues of grain size and thickness as limiting factors. Subsequent work added the issue of back-surface passivation. This article addresses the conditions required for the successful development of polycrystalline silicon into a high efficiency, low-cost, terrestrial product.


2006 ◽  
Vol 90 (20) ◽  
pp. 3557-3567 ◽  
Author(s):  
U. Gangopadhyay ◽  
K.H. Kim ◽  
S.K. Dhungel ◽  
U. Manna ◽  
P.K. Basu ◽  
...  

2016 ◽  
Vol 16 (10) ◽  
pp. 10659-10664 ◽  
Author(s):  
Nagarajan Balaji ◽  
Cheolmin Park ◽  
Seunghwan Lee ◽  
Youn-Jung Lee ◽  
Junsin Yi

2020 ◽  
pp. 413-441
Author(s):  
Shui-Yang Lien ◽  
Chia-Hsun Hsu ◽  
Xiao-Ying Zhang ◽  
Pao-Hsun Huang

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