Detection of molecular oxygen adsorbate during room-temperature oxidation of Si(100)2 × 1 surface: In situ synchrotron radiation photoemission study

2016 ◽  
Vol 55 (10) ◽  
pp. 100307 ◽  
Author(s):  
Akitaka Yoshigoe ◽  
Yoichi Yamada ◽  
Ryo Taga ◽  
Shuichi Ogawa ◽  
Yuji Takakuwa
1982 ◽  
Vol 25 (6) ◽  
pp. 3627-3636 ◽  
Author(s):  
G. Rossi ◽  
I. Abbati ◽  
L. Braicovich ◽  
I. Lindau ◽  
W. E. Spicer

1995 ◽  
Vol 93 (1) ◽  
pp. 1-5 ◽  
Author(s):  
Akinori Tanaka ◽  
Ashish Chainani ◽  
Tatsushi Miura ◽  
Takashi Takahashi ◽  
Takahumi Miyazaki ◽  
...  

2002 ◽  
Vol 09 (02) ◽  
pp. 803-808 ◽  
Author(s):  
NOZOMU KAMAKURA ◽  
MASANORI SHINOHARA ◽  
HAYATO WATANABE ◽  
TAKAYUKI KUWANO ◽  
AKIO SEYAMA ◽  
...  

We have used synchrotron radiation photoemission (SR-PES) and infrared absorption spectroscopy (IRAS) to investigate in situ the adsorption and decomposition of SiH 2 Cl 2 on Si (100)(2 × 1). Si 2p core level photoemission spectra and IRAS spectra in the Si–H stretching vibration region of the surface exposed to SiH 2 Cl 2 at room temperature have been measured to elucidate how SiH 2 Cl 2 adsorbs on the surface. PES data show that monochloride (SiCl) and hydride species ( SiH x) are generated upon dichlorosilane adsorption. IRAS data demonstrate that at initial stages of SiH 2 Cl 2 adsorption, the monohydride, the dihydride ( SiH 2) and the Cl-substituted hydride (–SiHCl) are populated on the surface. Comparison of PES and IRAS data indicates that Si–Cl bonds of the SiH 2 Cl 2 molecule are readily ruptured upon adsorption of dichlorosilane on the Si (100)(2 × 1).


1989 ◽  
Vol 36 (1-4) ◽  
pp. 240-246 ◽  
Author(s):  
W.C.M. Claassen ◽  
R.W.A.H. Schmitz ◽  
J. Dieleman

2015 ◽  
Vol 8 (2) ◽  
pp. 025701
Author(s):  
Ryuta Okada ◽  
Akitaka Yoshigoe ◽  
Yuden Teraoka ◽  
Yoichi Yamada ◽  
Masahiro Sasaki

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