XeCl Excimer Laser-Doping of Silicon Using Phosphorus and Boron Film as a Diffusant Source
Keyword(s):
1991 ◽
Vol 111
(4)
◽
pp. 46-51
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1999 ◽
Vol 38
(Part 2, No. 7A)
◽
pp. L761-L763
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1996 ◽
Vol 19
(3)
◽
pp. 273-283
Keyword(s):
1982 ◽
Vol 12
(11)
◽
pp. 1420-1424
1995 ◽
Vol 66
(11)
◽
pp. 5162-5164
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Keyword(s):
1991 ◽