RHEED Oscillation-Based Optimization of Growth Conditions for Gas-Source MBE Growth of InGaP Using Tertiarybutylphosphine

1997 ◽  
Author(s):  
Hironobu Sai ◽  
Hajime Fujikura ◽  
Hideki Hasegawa
1996 ◽  
Vol 449 ◽  
Author(s):  
S. Yoshida ◽  
H. Okumura ◽  
G. Feuillet ◽  
P. Hacke ◽  
K. Balakrishnan

ABSTRACTMolecular beam epitaxy (MBE) technique is a useful method to grow III-V nitrides, especially those having a metastable crystal structure, like cubic GaN (c-GaN), because of the capability of in situ observation of growing surfaces and its non-equilibrium growth mechanism. We have grown c-GaN on GaAs and 3C-SiC substrates by gas source MBE using dimethylhydrazine or activated nitrogen beam as an N source, and measured their luminescent and optical properties. This paper summarizes the MBE growth and properties of c-GaN, comparing with those of hexagonal one, and the control of the crystal structures is discussed in terms of growth method, orientation of substrate surfaces and growth conditions.


1997 ◽  
Vol 175-176 ◽  
pp. 150-155 ◽  
Author(s):  
K. Iwata ◽  
H. Asahi ◽  
K. Asami ◽  
S. Gonda

2005 ◽  
Author(s):  
Tsuen-Lin Lee ◽  
Jin-Shang Liu ◽  
Hao-Hsiung Lin
Keyword(s):  

1999 ◽  
Vol 25 (1-2) ◽  
pp. 477-479 ◽  
Author(s):  
J.L. Liu ◽  
S.J. Cai ◽  
G.L. Jin ◽  
Y.S. Tang ◽  
K.L. Wang

1997 ◽  
Vol 175-176 ◽  
pp. 1195-1199 ◽  
Author(s):  
H. Asahi ◽  
M. Fushida ◽  
K. Yamamoto ◽  
K. Iwata ◽  
H. Koh ◽  
...  
Keyword(s):  

2013 ◽  
Vol 378 ◽  
pp. 212-217 ◽  
Author(s):  
Keisuke Arimoto ◽  
Shoichiro Sakai ◽  
Hiroshi Furukawa ◽  
Junji Yamanaka ◽  
Kiyokazu Nakagawa ◽  
...  
Keyword(s):  

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