Multiterminal Pathfinding in Practical VLSI Systems with Deep Neural Networks

A multiterminal obstacle-avoiding pathfinding approach is proposed. The approach is inspired by deep image learning. The key idea is based on training a conditional generative adversarial network (cGAN) to interpret a pathfinding task as a graphical bitmap and consequently map a pathfinding task onto a pathfinding solution represented by another bitmap. To enable the proposed cGAN pathfinding, a methodology for generating synthetic dataset is also proposed. The cGAN model is implemented in Python/Keras, trained on synthetically generated data, evaluated on practical VLSI benchmarks, and compared with state-of-the-art. Due to effective parallelization on GPU hardware, the proposed approach yields a state-of-the-art like wirelength and a better runtime and throughput for moderately complex pathfinding tasks. However, the runtime and throughput with the proposed approach remain constant with an increasing task complexity, promising orders of magnitude improvement over state-of-the-art in complex pathfinding tasks. The cGAN pathfinder can be exploited in numerous high throughput applications, such as, navigation, tracking, and routing in complex VLSI systems. The last is of particular interest to this work.

An End-to-End Computer Vision Methodology for Quantitative Metallography

Metallography is crucial for a proper assessment of material's properties. It involves mainly the investigation of spatial distribution of grains and the occurrence and characteristics of inclusions or precipitates.This work presents an holistic artificial intelligence model for Anomaly Detection that automatically quantifies the degree of anomaly of impurities in alloys. We suggest the following examination process: (1) Deep semantic segmentation is performed on the inclusions (based on a suitable metallographic database of alloys and corresponding tags of inclusions), producing inclusions masks that are saved into a separated database. (2) Deep image inpainting is performed to fill the removed inclusions parts, resulting in 'clean' metallographic images, which contain the background of grains. (3) Grains' boundaries are marked using deep semantic segmentation (based on another metallographic database of alloys), producing boundaries that are ready for further inspection on the distribution of grains' size. (4) Deep anomaly detection and pattern recognition is performed on the inclusions masks to determine spatial, shape and area anomaly detection of the inclusions. Finally, the system recommends to an expert on areas of interests for further examination. The performance of the model is presented and analyzed based on few representative cases. Although the models presented here were developed for metallography analysis, most of them can be generalized to a wider set of problems in which anomaly detection of geometrical objects is desired. All models as well as the data-sets that were created for this work, are publicly available at https://github.com/MLography/MLography.