Design of One-DOF Triangular Resch Pattern With Thick-Panel Origami

Resch patterns have a great potential to be utilized in many engineering applications, as they can be folded into curved profiles from planar sheets. They are rigid foldable but with a large number of degrees of freedom (DOF) when there are many units tessellating in the patterns, which constrains the applications due to the difficulty in control the motion symmetrically. In this paper, in order to achieve the single mobility for a limited number of triangular Resch pattern units, the thick-panel technique is employed at each vertex to reduce the DOF to one. Then the compatibility among all the vertices has to be satisfied by the systematical kinematic analysis on the geometric parameters of the Resch pattern and panel thickness. Eventually, two design schemes are obtained to form the one DOF origami structure with doubly-curved intermediate folding configurations, which could be further tessellated into a large pattern for various engineering applications.

Direct Measurement of Planarization Length for Copper Chemical Mechanical Planarization Polishing (CMP) Processes Using a Large Pattern Test Mask

ABSTRACTWehaveusedalargepatterntestmaskandaspecificarrangementofstructuresonawaferfor direct measurement of an average planarization length for copper chemical mechanical polishing (CMP)processes.Weproposenewminimum,maximum,andaverageplanarizationlengthdefini-tions, based on up and down area measurements as a function of trench width. The average pla-narizationlengthisusefulforqualitativelycomparingtheplanarizationcapabilityofcopperCMP processes. We have also performed several experiments that show how the average planarization length depends on polish process settings such as down force and relative speed, as well as on consumables such as pad and slurry.

Random causes with directed effects: the Indo-European language spread and the stochastic loss of lineages

Since the beginning, studies of Indo-European have seen it as a large phenomenon necessarily having a large, usually single cause. Yet apparent pattern can arise from chance causes that need have no great historical order. In a minimalist view, set out here as a theoretical hypothesis, the pattern of Indo-European can simply arise from a kind of social Brownian motion, in which a large pattern invents itself out of countless little perturbations between adjacent language communities

Periodicity of Strength of Pattern in Binocular Rivalry

The effect of suppression in binocular rivalry is divided into the effects of boundary and of region. By removing the effect of boundary from the double effects, we examined whether the strength of pattern oscillates throughout duration of suppression phase. Probabilities of appearance of the suppressed test patterns were measured immediately after the removal of the suppressing pattern at various temporal points after onset of suppression. The probabilities decrease, reach a minimum level, and then increase throughout the course of the suppression phase. Immediately after the beginning of the suppression phase, the small test pattern whose duration of suppression is short rarely appears, while the large pattern whose duration of suppression is long certainly appears. These results support our hypothesis for which the key assumption is that the strength of pattern periodically oscillates as a function of duration of observation time.