ARCHITEKTŪROS POLITIKOS APRAIŠKOS LIETUVOS TARPUKARIO (1918–1940 M.) PERIODIKOJE: TARP REPREZENTACIJOS IR SOCIALINIO TEISINGUMO

The paper concentrates on architectural discourse of the interwar period (1918–1940) of Lithuania. The main objective of the paper is to represent the history of the Lithuanian architectural thought of the period through analysis of the interwar press. Due to a wide scope of the problem the paper is devoted to one of the major problems of architectural theory – relation of policy/power and space. Following publications in the press, a few dominant aspects of the problem were distinquished: representation of the state (as an exemplar element of global political ideology), and issues of social housing (as illustration of local, towards practical decisions oriented policy). It is discovered that the dominant theoretical position concerning the matters of spatial representation is discussions on “national style”. While the socio-political discourse of Modern Movement mainly concentrates on discussions about “social housing colonies”. Santrauka Straipsnis skirtas Lietuvos tarpukario laikotarpio (1918–1940) teorinio diskurso analizei. Tekste, remiantis periodikoje publikuotais straipsniais, skirtais architektūros temoms, siekiama pažvelgti į šio periodo architektūrinės minties palikimą. Dėmesio objektu pasirinkta viena iš svarbesnių architektūrinio diskurso temų – architektūros ir politikos sąsajos. Išskiriami keli to meto spaudoje dominavę architektūros ir politikos sąveikos aspektai: valstybės erdvinės reprezentacijos problematika (kaip globalios, ideologinės politikos apraiška) bei socialinio būsto problematika (kaip lokalios, į tiesioginius sprendimus orientuotos politikos apraiška). Nustatyta, kad reprezentacinėje plotmėje dominuojanti teorinė pozicija – „tautinio stiliaus“ paieškos. Socialinei, politizuotai modernizmo teorijai būdingi aspektai daugiausiai reiškėsi menkiau teoretizuotose diskusijose apie „pigių būstų kolonijų“ kūrimą.

Optical Property Analysis of Microbolometer Based on MEMS

The optical constant of TiN and amorphous silicon thin film as well as film thickness of thermal resistive amorphous silicon were measured by ellipsometry apparatus, which were in agreement with the result from SEM section analysis. According to optical admittance matrix theory, relation between sensing film thickness, resonant cavity height of microbolometer and infrared absorptivity was simulated using FEA (Finite Element Analysis) MatLab software. Optimal film thickness and resonant cavity height for high infrared absorptivity ranging from 3–5 to 8–14 μm atmosphere window infrared bands were achieved, which provides reliable evidence to improve the sensitivity of microbolometer.