chemical polishing
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Author(s):  
Min Li ◽  
Minghui Liu ◽  
Oltmann Riemer ◽  
Bernhard Karpuschewski ◽  
Cheng Tang


Author(s):  
Agnieszka Chmielewska ◽  
Ahmadreza Jahadakbar ◽  
Bartłomiej Wysocki ◽  
Mohammad Elahinia ◽  
Wojciech Święszkowski ◽  
...  


2021 ◽  
Vol 16 (06) ◽  
pp. P06031
Author(s):  
F.Y. Yang ◽  
J. Dai ◽  
P. Zhang ◽  
N. Wang ◽  
Z.Q. Li


2021 ◽  
Vol 124 ◽  
pp. 105608
Author(s):  
Yiwei Li ◽  
Yawei Wang ◽  
Wenyu Zhang ◽  
Kun Cao ◽  
Yang Li ◽  
...  


Author(s):  
Ana Carolina Bomfim Rodrigues ◽  
Santiago Caraguay ◽  
Julio Cordioli ◽  
Fabio Antonio Xavier




2020 ◽  
Vol 25 ◽  
pp. 101396 ◽  
Author(s):  
Martin Bezuidenhout ◽  
Gerrit Ter Haar ◽  
Thorsten Becker ◽  
Sabrina Rudolph ◽  
Oliver Damm ◽  
...  


Polymers ◽  
2020 ◽  
Vol 12 (11) ◽  
pp. 2574
Author(s):  
Chia-Wen Tsao ◽  
Zheng-Kun Wu

Polymer-based micromolding has been proposed as an alternative to SU-8 micromolding for microfluidic chip fabrication. However, surface defects such as milling marks may result in rough microchannels and micromolds, limiting microfluidic device performance. Therefore, we use chemical and mechanical methods for polishing polymer microchannels and micromolds. In addition, we evaluated their performance in terms of removing the machining (milling) marks on polymer microchannel and micromold surfaces. For chemical polishing, we use solvent evaporation to polish the sample surfaces. For mechanical polishing, wool felt polishing bits with an abrasive agent were employed to polish the sample surfaces. Chemical polishing reduced surface roughness from 0.38 μm (0 min, after milling) to 0.13 μm after 6 min of evaporation time. Mechanical polishing reduced surface roughness from 0.38 to 0.165 μm (optimal pressing length: 0.3 mm). As polishing causes abrasion, we evaluated sample geometry loss after polishing. Mechanically and chemically polished micromolds had optimal micromold distortion percentages of 1.01% ± 0.76% and 1.10% ± 0.80%, respectively. Compared to chemical polishing, mechanical polishing could better maintain the geometric integrity since it is locally polished by computer numerical control (CNC) miller. Using these surface polishing methods with optimized parameters, polymer micromolds and microchannels can be rapidly produced for polydimethylsiloxane (PDMS) casting and thermoplastic hot embossing. In addition, low-quantity (15 times) polymer microchannel replication is demonstrated in this paper.



Polymers ◽  
2020 ◽  
Vol 12 (11) ◽  
pp. 2490
Author(s):  
Dominika Ogończyk ◽  
Paweł Jankowski ◽  
Piotr Garstecki

Here we present a new methodology for chemical polishing of microchannels in polycarbonate (PC). Tuning the time of exposition and the concentration of ammonia, the roughness arising from the micromachining process can be significantly reduced or completely removed while preserving the structure of microchannels. Besides smoothing out the surface, our method modifies the wettability of the surface, rendering it hydrophobic. The method increases the optical transparency of microchannels and eliminates undesired effects in two-phase microfluidic systems, including wetting by aqueous solutions and cross-contamination between aqueous droplets that could otherwise shed satellites via pinning.



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