IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - ASMC '92 Proceedings
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Optimized metalization processing for improved manufacturability

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - ASMC '92 Proceedings ◽

10.1109/asmc.1992.253840 ◽

2003 ◽

Author(s):

V. Chowdhury ◽

G. Harper ◽

S.L.S. Song ◽

H.B. Brugge

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New ultra large field submicron i-line stepper for advanced mix-and-match applications

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - ASMC '92 Proceedings ◽

10.1109/asmc.1992.253841 ◽

2003 ◽

Cited By ~ 1

Author(s):

L. Wise ◽

R. Mahany ◽

L. Wang

Keyword(s):

Large Field ◽

Mix And Match

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Energy contamination control in multiple charged ion implantations

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - ASMC '92 Proceedings ◽

10.1109/asmc.1992.253845 ◽

2003 ◽

Cited By ~ 1

Author(s):

P.F.H.M. van der Meulen

Keyword(s):

Contamination Control

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Plasma-etching induced damage in thin oxide

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - ASMC '92 Proceedings ◽

10.1109/asmc.1992.253842 ◽

2003 ◽

Cited By ~ 4

Author(s):

H. Shin ◽

C. Hu

Keyword(s):

Plasma Etching ◽

Thin Oxide

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Simultaneous in-situ measurement of film thickness and temperature by using multiple wavelength pyrometric interferometry (MWPI)

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - ASMC '92 Proceedings ◽

10.1109/asmc.1992.253839 ◽

2003 ◽

Cited By ~ 1

Author(s):

F.G. Boebel ◽

H. Moller

Keyword(s):

Film Thickness ◽

In Situ Measurement ◽

Multiple Wavelength

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Self-learning fuzzy modeling of semiconductor processing equipment

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - ASMC '92 Proceedings ◽

10.1109/asmc.1992.253846 ◽

2003 ◽

Cited By ~ 8

Author(s):

R.L. Chen ◽

C.J. Spanos

Keyword(s):

Fuzzy Modeling ◽

Semiconductor Processing ◽

Processing Equipment ◽

Self Learning

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MOS device technology trend and future direction

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - ASMC '92 Proceedings ◽

10.1109/asmc.1992.253838 ◽

2003 ◽

Author(s):

T. Nakato

Keyword(s):

Future Direction ◽

Technology Trend ◽

Device Technology ◽

Mos Device

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Application of real-time expert systems in semiconductor manufacturing

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - ASMC '92 Proceedings ◽

10.1109/asmc.1992.253844 ◽

2003 ◽

Cited By ~ 2

Author(s):

V. Subbiah ◽

J. Bodenstab

Keyword(s):

Expert Systems ◽

Real Time ◽

Semiconductor Manufacturing

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Using a statistical experimental design to optimize a phosphorus deposition process in a high volume production facility

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - ASMC '92 Proceedings ◽

10.1109/asmc.1992.253781 ◽

2003 ◽

Author(s):

P. Fearon ◽

B. Caldwell

Keyword(s):

Experimental Design ◽

High Volume ◽

Deposition Process ◽

Statistical Experimental Design ◽

Production Facility ◽

High Volume Production ◽

Volume Production

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Test equipment correlation: a statistical approach

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - ASMC '92 Proceedings ◽

10.1109/asmc.1992.253784 ◽

2003 ◽

Cited By ~ 1

Author(s):

H. Kumar ◽

S. Erjavic

Keyword(s):

Statistical Approach ◽

Test Equipment

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IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - ASMC '92 ProceedingsLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

Optimized metalization processing for improved manufacturability

New ultra large field submicron i-line stepper for advanced mix-and-match applications

Energy contamination control in multiple charged ion implantations

Plasma-etching induced damage in thin oxide

Simultaneous in-situ measurement of film thickness and temperature by using multiple wavelength pyrometric interferometry (MWPI)

Self-learning fuzzy modeling of semiconductor processing equipment

MOS device technology trend and future direction

Application of real-time expert systems in semiconductor manufacturing

Using a statistical experimental design to optimize a phosphorus deposition process in a high volume production facility

Test equipment correlation: a statistical approach

IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop - ASMC '92 Proceedings
Latest Publications