2015 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK)
Latest Publications

TOTAL DOCUMENTS

63

(FIVE YEARS 0)

H-INDEX

2

(FIVE YEARS 0)

Published By IEEE

9781479986149, 9781479986156

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Basic properties of resistive memory diode composed of BaTiO3 ferroelectric thin film by MOD process

2015 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) ◽

10.1109/imfedk.2015.7158567 ◽

2015 ◽

Author(s):

Toshiyuki Sugie ◽

Shuhei Hashimoto ◽

Ziyang Zhang ◽

Kaoru Yamashita ◽

Minoru Noda

Keyword(s):

Thin Film ◽

Ferroelectric Thin Film ◽

Resistive Memory ◽

Basic Properties

Download Full-text

Thermoelectric properties of a-InGaZnO thin film

2015 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) ◽

10.1109/imfedk.2015.7158576 ◽

2015 ◽

Author(s):

Yuta Fujimoto ◽

Mutsunori Uenuma ◽

Yasuaki Ishikawa ◽

Yukiharu Uraoka

Keyword(s):

Thin Film ◽

Thermoelectric Properties

Download Full-text

1.2kW power combiner unit using phase control for 2.4GHz band

2015 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) ◽

10.1109/imfedk.2015.7158582 ◽

2015 ◽

Author(s):

Hikaru Ikeda ◽

Tomohide Kamiyama ◽

Tadashi Nitta ◽

Takashi Uno ◽

Motoyoshi Iwata ◽

...

Keyword(s):

Phase Control ◽

Download Full-text

Impacts of orientation and cross-sectional shape on hole mobility of Si nanowire MOSFETs

2015 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) ◽

10.1109/imfedk.2015.7158572 ◽

2015 ◽

Author(s):

Hiroaki Fujihara ◽

Naoya Morioka ◽

Hajime Tanaka ◽

Jun Suda ◽

Tsunenobu Kimoto

Keyword(s):

Hole Mobility ◽

Cross Sectional ◽

Si Nanowire ◽

Nanowire Mosfets ◽

Sectional Shape

Download Full-text

Electrical conduction mechanisms of thin zinc-oxide films prepared by RF sputtering

2015 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) ◽

10.1109/imfedk.2015.7158547 ◽

2015 ◽

Author(s):

Jiesheng Zhang ◽

Tadashi Saitoh ◽

Yasuhisa Omura

Keyword(s):

Electrical Conduction ◽

Oxide Films ◽

Rf Sputtering ◽

Zinc Oxide Films ◽

Conduction Mechanisms ◽

Electrical Conduction Mechanisms

Download Full-text

Evolution of nanoscale silicon CMOS technology for ultra low power application

2015 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) ◽

10.1109/imfedk.2015.7158570 ◽

2015 ◽

Author(s):

T. Matsukawa ◽

Y. Morita ◽

T. Mori ◽

Y.X. Liu ◽

S. O'uchi ◽

...

Keyword(s):

Low Power ◽

Cmos Technology ◽

Ultra Low Power ◽

Power Application ◽

Download Full-text

Photo-excited carrier transport of CuPc/C60 organic thin-film solar cells

2015 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) ◽

10.1109/imfedk.2015.7158568 ◽

2015 ◽

Author(s):

N. Isobe ◽

T. Miyake ◽

S. Yamanaka ◽

T. Saitoh ◽

M. Inada

Keyword(s):

Thin Film ◽

Solar Cells ◽

Carrier Transport ◽

Thin Film Solar Cells ◽

Organic Thin Film ◽

Excited Carrier

Download Full-text

Evaluation of In2O3 thin film deposited by RF magnetron sputtering

2015 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) ◽

10.1109/imfedk.2015.7158565 ◽

2015 ◽

Author(s):

Toshihiro Yoshioka ◽

Junji Ogawa ◽

Masahiro Yuge ◽

Tokiyoshi Matsuda ◽

Mutsumi Kimura

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Rf Magnetron Sputtering

Download Full-text

Awards [2 awards]

2015 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) ◽

10.1109/imfedk.2015.7158485 ◽

2015 ◽

Download Full-text

Neuron MOS inverter and source follower using thin-film transistors

2015 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) ◽

10.1109/imfedk.2015.7158564 ◽

2015 ◽

Author(s):

Nao Nakamura ◽

Kenji Shimada ◽

Tokiyoshi Matsuda ◽

Mutsumi Kimura

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Source Follower

Download Full-text